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Heterojunction solar cell and manufacturing method thereof

A technology of solar cells and heterojunctions, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of increasing the risk of edge damage, the risk of leakage current, and insufficient passivation of the edge region of the monocrystalline silicon substrate 10' , to improve the photoelectric conversion efficiency, improve the passivation effect, and reduce the risk of damage

Pending Publication Date: 2022-03-11
CSI SOLAR TECH (JIAXING) CO LTD
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Problems solved by technology

[0005] However, the heterojunction solar cells involved in the prior art have the following problems: the side of the single crystal silicon substrate 10' is not shielded by the amorphous silicon layer, and the first transparent conductive film layer 41' and the second transparent conductive film layer 42' are easily separated from the single crystal silicon substrate 10'. The direct contact between the crystalline silicon substrates 10' has the risk of electric leakage; the direct exposure of the edge of the single crystalline silicon substrate 10' will increase the risk of edge damage; the passivation of the edge area of ​​the single crystalline silicon substrate 10' is insufficient

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  • Heterojunction solar cell and manufacturing method thereof
  • Heterojunction solar cell and manufacturing method thereof
  • Heterojunction solar cell and manufacturing method thereof

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Embodiment Construction

[0063] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0064] refer to figure 2 , Figure 9 , Figure 10 , Figure 11 As shown, the heterojunction solar cell involved in the present invention includes a single crystal silicon substrate 10, a first intrinsic amorphous layer 21, a first doped amorphous layer 31, a first transparent conductive film layer 41, a first set An electrode 51 , a second intrinsic amorphous layer 22 , a second doped amorphous layer 32 , a second transparent cond...

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Abstract

The invention provides a heterojunction solar cell and a manufacturing method thereof, and a plurality of amorphous layers are formed on the side surface of a monocrystalline silicon substrate of the heterojunction solar cell structure. Electric leakage caused by direct contact among the first transparent conductive film layer, the second transparent conductive film layer and the side surface of the monocrystalline silicon substrate can be avoided, and the risk that the edge of the monocrystalline silicon substrate is damaged is reduced; and the side surface of the monocrystalline silicon substrate is wrapped by the first intrinsic amorphous layer and the second intrinsic amorphous layer together, so that the overall passivation effect of the monocrystalline silicon substrate can be effectively improved, and the photoelectric conversion efficiency of the heterojunction battery piece is further improved.

Description

technical field [0001] The invention relates to the field of photovoltaic manufacturing, in particular to a heterojunction solar cell and a manufacturing method thereof. Background technique [0002] Heterojunction solar cells are currently a relatively efficient crystalline silicon solar cell, which combines the characteristics of crystalline silicon cells and silicon-based thin-film cells, and has the advantages of short manufacturing process, low process temperature, high conversion efficiency and large power generation. figure 1 Shown is a schematic structural diagram of a heterojunction solar cell involved in the prior art, which includes a first collector electrode 51', a first transparent conductive film layer 41', a first doped amorphous layer 31', The first intrinsic amorphous layer 21', the single crystal silicon substrate 10', the second intrinsic amorphous layer 22', the second doped amorphous layer 32', the second transparent conductive film layer 42', the secon...

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Application Information

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IPC IPC(8): H01L31/074H01L31/0216H01L31/18
CPCH01L31/074H01L31/02167H01L31/02168H01L31/1868Y02E10/50Y02P70/50
Inventor 姚铮吴华德张达奇吴坚蒋方丹邢国强
Owner CSI SOLAR TECH (JIAXING) CO LTD