UV photocuring composition with low moisture transmittance and preparation method thereof

A technology of moisture vapor transmission rate and light curing, which is applied in the field of sealing rings, can solve the problems of low strength and high moisture vapor transmission rate, and achieve the effect of good interaction and low moisture vapor transmission rate

Active Publication Date: 2022-03-15
HANGZHOU ZHIJIANG SILICONE CHEM +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, limited by the light-curing mechanism, the range of optional materials, and the application scenarios, compared with traditional EPDM rubber, fluororubber, natural rubber and other rubber-based sealing rings, generally light-cured sealing rings are more effective in moisture permeability. Obvious disadvantage in rate
[0003] The current commercial light-curing adhesives used for "in-situ forming" sealing rings mainly include polyurethane acrylate oligomers and silicone-modified acrylic oligomers. The former has a solid body strength, Elongation and other properties meet the application requirements, but the moisture vapor transmission rate is higher; the body strength of the latter after curing is not high, and the moisture vapor transmission rate is higher than the former
Therefore, for applications with high moisture resistance requirements, both solutions have drawbacks

Method used

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  • UV photocuring composition with low moisture transmittance and preparation method thereof
  • UV photocuring composition with low moisture transmittance and preparation method thereof
  • UV photocuring composition with low moisture transmittance and preparation method thereof

Examples

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preparation example Construction

[0059] The present invention also provides a method for preparing the UV photocurable composition with low moisture vapor transmission rate described in the above technical solution, comprising the following steps:

[0060] a) mixing acrylate monomers, polybutadiene-modified urethane acrylate oligomers, photoinitiators and chain transfer agents for the first time to obtain a mixture;

[0061] b) adding hydrophobic fumed silica to the mixture obtained in step a), performing second mixing, and obtaining a UV photocurable composition with low moisture vapor transmission rate after defoaming.

[0062] In the invention, the acrylate monomer, polybutadiene-modified urethane acrylate oligomer, photoinitiator and chain transfer agent are mixed for the first time to obtain the mixture. In the present invention, the acrylate monomer, polybutadiene-modified urethane acrylate oligomer, photoinitiator and chain transfer agent are the same as those in the above technical solution, and will ...

Embodiment 1～6 and comparative example 1～4

[0089] Referring to Tables 1-2, Table 1 is the raw material composition table of Examples 1-6, and Table 2 is the raw material composition table of Comparative Examples 1-4.

[0090] The raw material composition table of table 1 embodiment 1~6

[0091]

[0092]

[0093] The raw material composition table of table 2 comparative examples 1~4

[0094] a h i b c d e f g Comparative example 1 - 56 - 14 30 3 3 5 5 Comparative example 2 - - 56 14 30 3 3 5 5 Comparative example 3 - 28 28 14 30 3 3 5 5 Comparative example 4 70 - - - 30 3 3 5 5

[0095] The specific preparation method is as follows:

[0096] Referring to Table 1-2 raw material composition table, first dissolve all photoinitiator e and part of acrylate monomer c into acrylate monomer c at a mass ratio of 1:2, and then add oligomer 1 into the reactor , oligomer 2, chain transfer agent d, remaining acrylate monomer c, disperse at 20rpm fo...

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Abstract

The invention provides a UV (ultraviolet) photocuring composition with low moisture transmittance. The UV photocuring composition is prepared from the following raw materials in parts by weight: 25-30 parts of acrylate monomer; 70 to 75 parts by weight of a polybutadiene modified polyurethane acrylate oligomer; 3-5 parts by weight of a photoinitiator; 3-5 parts by weight of a chain transfer agent; and 6-10 parts by weight of hydrophobic fumed silica. Compared with the prior art, the UV photocuring composition with low moisture transmittance provided by the invention adopts the components with specific contents, better interaction is realized, and the obtained cured product has low moisture transmittance on the basis that the tensile strength, the elongation and the hardness meet the application requirements, and is suitable for being applied to sealing rings with higher requirements on moisture resistance. Experimental results show that the tensile strength of a cured product of the UV photocuring composition with low moisture transmittance provided by the invention is 2.8 MPa to 4.8 MPa, the elongation is 150% to 250%, the hardness (shore A) is 52 to 58, and the moisture permeability is 3.5 g/m < 2 > to 5.2 g/m < 2 >.

Description

technical field [0001] The invention relates to the technical field of sealing rings, in particular to a UV photocurable composition with low moisture vapor transmission rate and a preparation method thereof. Background technique [0002] In many industrial segments, sealing rings are widely used. The seal ring is generally in the form of a preformed seal in the form of an embedded or flat gasket in the joint of the parts to be sealed to play a sealing role. The manufacture of this type of sealing ring usually needs to be molded by means of rubber vulcanization or glue curing. The rapid development of light-curing molding technology has made "gasket-in-place" a reality. Compared with the sealing ring formed by the traditional method, the in-situ forming method has the advantages of free of molds, customization and high production efficiency. However, limited by the light-curing mechanism, the range of optional materials, and the application scenarios, compared with tradit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F283/00C08F220/18C08K9/04C08K3/36
CPCC08F283/008C08K9/04C08K3/36C08F220/1811
Inventor 桑广艺夏佳斌陶小乐何永富
Owner HANGZHOU ZHIJIANG SILICONE CHEM
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