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A kind of UV light curing composition with low moisture vapor transmission rate and preparation method thereof

A technology of moisture vapor transmission rate and light curing, which is applied in the field of sealing rings, can solve the problems of low strength and high moisture vapor transmission rate, and achieve the effect of good interaction and low moisture vapor transmission rate

Active Publication Date: 2022-07-12
HANGZHOU ZHIJIANG SILICONE CHEM +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, limited by the light-curing mechanism, the range of optional materials, and the application scenarios, compared with traditional EPDM rubber, fluororubber, natural rubber and other rubber-based sealing rings, generally light-cured sealing rings are more effective in moisture permeability. Obvious disadvantage in rate
[0003] The current commercial light-curing adhesives used for "in-situ forming" sealing rings mainly include polyurethane acrylate oligomers and silicone-modified acrylic oligomers. The former has a solid body strength, Elongation and other properties meet the application requirements, but the moisture vapor transmission rate is higher; the body strength of the latter after curing is not high, and the moisture vapor transmission rate is higher than the former
Therefore, for applications with high moisture resistance requirements, both solutions have drawbacks

Method used

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  • A kind of UV light curing composition with low moisture vapor transmission rate and preparation method thereof
  • A kind of UV light curing composition with low moisture vapor transmission rate and preparation method thereof
  • A kind of UV light curing composition with low moisture vapor transmission rate and preparation method thereof

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preparation example Construction

[0059] The present invention also provides a preparation method of the UV light-curable composition with low moisture vapor transmission rate described in the above technical solution, comprising the following steps:

[0060] a) mixing acrylate monomer, polybutadiene-modified urethane acrylate oligomer, photoinitiator and chain transfer agent for the first time to obtain a mixture;

[0061] b) adding hydrophobic fumed silica to the mixture obtained in step a), and mixing for the second time to obtain a UV-curable composition with low moisture vapor transmission rate after defoaming.

[0062] In the present invention, the acrylate monomer, the polybutadiene-modified urethane acrylate oligomer, the photoinitiator and the chain transfer agent are mixed for the first time to obtain a mixture. In the present invention, the acrylate monomer, the polybutadiene-modified urethane acrylate oligomer, the photoinitiator and the chain transfer agent are the same as those in the above-menti...

Embodiment 1～6 and comparative example 1～4

[0089] Referring to Tables 1-2, Table 1 is the raw material composition table of Examples 1-6, and Table 2 is the raw material composition table of Comparative Examples 1-4.

[0090] Table 1 Raw material composition table of Examples 1 to 6

[0091]

[0092]

[0093] Table 2 Raw material composition table of Comparative Examples 1-4

[0094] a h i b c d e f g Comparative Example 1 - 56 - 14 30 3 3 5 5 Comparative Example 2 - - 56 14 30 3 3 5 5 Comparative Example 3 - 28 28 14 30 3 3 5 5 Comparative Example 4 70 - - - 30 3 3 5 5

[0095] The specific preparation method is as follows:

[0096] Referring to the raw material composition table in Tables 1-2, first dissolve all the photoinitiator e and part of the acrylate monomer c into the acrylate monomer c according to the mass ratio of 1:2, and then add the oligomer 1 to the reactor , oligomer 2, chain transfer agent d, remaining acrylate mono...

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Abstract

The invention provides a UV light curing composition with low moisture vapor transmission rate, which is prepared from raw materials including the following components: 25-30 parts by weight of acrylate monomers; 70-75 parts by weight of polymer; 3-5 parts by weight of photoinitiator; 3-5 parts by weight of chain transfer agent; 6-10 parts by weight of hydrophobic fumed silica. Compared with the prior art, the UV light-curable composition with low moisture vapor transmission rate provided by the present invention adopts specific content of components to achieve better interaction, and the cured product obtained by the product has tensile strength, elongation and On the basis that the hardness meets the application requirements, the moisture vapor transmission rate is low, and it is suitable for sealing ring applications with high requirements for moisture resistance. The experimental results show that the tensile strength of the cured product of the UV light curing composition with low moisture vapor transmission rate provided by the present invention is 2.8MPa-4.8MPa, the elongation is 150%-250%, and the hardness (Shore A) is 52~ 58, the moisture permeability is 3.5g / m 2 ~5.2g / m 2 .

Description

technical field [0001] The invention relates to the technical field of sealing rings, and more particularly, to a UV light curing composition with low moisture vapor transmission rate and a preparation method thereof. Background technique [0002] In many industrial segments, sealing rings are widely used. The sealing ring is generally in the form of a pre-formed seal in the form of an embedded or flat gasket at the joint of the parts to be sealed to play a sealing role. The manufacture of this type of sealing ring usually needs to be formed by means of rubber vulcanization or glue curing with the aid of a mold. The rapid development of light curing molding technology has made "Gasket-in-Place" a reality. Compared with the sealing ring formed by the traditional method, the in-situ forming method has the advantages of no mold, customization and high production efficiency. However, due to the limitation of the light curing mechanism, the range of optional materials and the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F283/00C08F220/18C08K9/04C08K3/36
CPCC08F283/008C08K9/04C08K3/36C08F220/1811
Inventor 桑广艺夏佳斌陶小乐何永富
Owner HANGZHOU ZHIJIANG SILICONE CHEM
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