Self-cleaning type cooling tank for high polymer material production

A polymer material and self-cleaning technology, which is applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as inability to cool liquids to assist cooling, large cooling dead angles, and inability to clean polymer materials. , to achieve the effect of improving convenience, rapid cooling and cleaning

Inactive Publication Date: 2022-03-25
孙小龙
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, as far as the current self-cleaning cooling tank for traditional polymer material production is concerned, first of all, the existing device cannot clean the polymer material during cooling, and the cooling dead angle is too large; secondly, the existing device cannot Simultaneously realize the auxiliary cooling of the cooling liquid

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning type cooling tank for high polymer material production
  • Self-cleaning type cooling tank for high polymer material production
  • Self-cleaning type cooling tank for high polymer material production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0037] Example: Please refer to Figure 1 to Figure 8 :

[0038] The present invention proposes a self-cleaning cooling tank for the production of polymer materials, including: a box body 1, a placement part 2, an auxiliary part 3 and a heat dissipation part 4;

[0039] The box body 1 is placed on the workbench;

[0040] The placing part 2 is composed of a mounting base 201, an elastic telescopic rod 202, a placing plate 203, a through hole 204 and a protrusion 205, and there are two mounting bases 201, and the two mounting bases 201 are fixedly connected to the box body by bolts. 1 on the inner wall;

[0041] The auxiliary part 3 is composed of a rotating shaft 301, an impeller 302 and a driving motor 303, and the rotating shaft 301 is rotatably connected to the box body 1;

[0042] The heat dissipation part 4 is composed of a piston bottle 401 , a connecting pipe 402 , a spray pipe 403 and a spray hole 404 , and there are two piston bottles 401 , and the two piston bottle...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a self-cleaning type cooling tank for high polymer material production, and relates to the technical field of high polymer production auxiliary equipment, the self-cleaning type cooling tank comprises a box body, a placing part, an auxiliary part and a heat dissipation part; the box body is placed on the workbench; the box body is of a rectangular box-shaped structure, and heat dissipation grooves are formed in the left end face and the right end face of the box body in a linear array mode. The impeller is located below the placing plate, when the impeller rotates, the impeller makes elastic contact with the bottom end face of the placing plate, at the moment, the placing plate reciprocates up and down, and therefore water spraying at the spraying holes can be achieved. Due to the fact that the protrusions are welded to the containing plate in the linear array shape, each protrusion is of a semi-cylindrical structure and makes contact with the high polymer material, the contact area of the high polymer material and the containing plate can be reduced, and the problems that firstly, an existing device cannot achieve cleaning of the high polymer material during cooling, and the cooling dead angle is too large are solved; and secondly, the problem that an existing device cannot achieve auxiliary cooling of cooling liquid while cooling is conducted is solved.

Description

technical field [0001] The invention relates to the technical field of polymer production auxiliary equipment, in particular to a self-cleaning cooling tank for polymer material production. Background technique [0002] Natural polymers are polymer substances that exist in animals, plants and organisms, and can be divided into natural fibers, natural resins, natural rubber, animal glue, etc.; synthetic polymer materials mainly refer to the three major synthetic materials of plastics, synthetic rubber and synthetic fibers. Materials, polymer materials need to be liquid cooled after production. [0003] However, as far as the current self-cleaning cooling tank for traditional polymer material production is concerned, first of all, the existing device cannot clean the polymer material during cooling, and the cooling dead angle is too large; secondly, the existing device cannot At the same time, the auxiliary cooling of the cooling liquid is realized. Contents of the inventio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B29C35/16B08B3/02B08B3/10B08B13/00
CPCB29C35/16B08B3/022B08B3/102B08B13/00B29C2035/1616
Inventor 孙小龙
Owner 孙小龙
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap