Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Epitaxial structure with quantum dot layer, manufacturing method thereof and light emitting diode chip

A technology of light-emitting diodes and epitaxial structures, applied to electrical components, circuits, semiconductor devices, etc., can solve problems such as low internal quantum efficiency, peak efficiency shift, and reduced luminous efficiency, and achieve high internal quantum efficiency and improve luminous efficiency , Improve the effect of production quality

Pending Publication Date: 2022-04-01
YANGZHOU CHANGELIGHT
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As the wavelength becomes shorter, the Al composition needs to increase continuously, but the increase of the Al composition will make the AlGaInP material change from a direct band gap to an indirect band gap, resulting in low internal quantum efficiency and low brightness of the device
In addition, the peak efficiency of micro-sized light-emitting diode chips will shift to high current, and the luminous efficiency will drop sharply under low current. So how to improve the luminous efficiency of the device is a big problem facing micro-light-emitting diode chips.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Epitaxial structure with quantum dot layer, manufacturing method thereof and light emitting diode chip
  • Epitaxial structure with quantum dot layer, manufacturing method thereof and light emitting diode chip
  • Epitaxial structure with quantum dot layer, manufacturing method thereof and light emitting diode chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0044] As mentioned in the background art, in recent years, with the rapid development of AlGaInP-based light-emitting diode chips, the traditional devices with multiple quantum wells as the active region structure are also quite mature. Quaternary system (Al X Ga 1-X ) 0.5 In 0.5 The P material has a wide band gap, and as the Al composition changes in the range of 0 to 0.5, the emission wavelength can vary from 650 nm for red ligh...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

According to the epitaxial structure with the quantum dot layer, the manufacturing method of the epitaxial structure and the light-emitting diode chip, the quantum dot active layer serves as an active region, and due to the fact that the quantum dot layer has a limiting effect on current carriers in the three-dimensional direction, the light-emitting efficiency of the light-emitting diode chip can be improved, and the light-emitting efficiency of the light-emitting diode chip is improved. And high brightness can be realized even under low current. And moreover, the quantum dot active layer is used as an active region, and the Al component does not need to be improved in order to obtain a relatively short light-emitting wavelength, so that the internal quantum efficiency of the light-emitting diode chip is relatively high. Moreover, the In component of the non-doped layer is made to be larger than the In component of the N-type barrier layer, so that the non-doped layer and the substrate material have large positive mismatch, a good condition is provided for growth of the quantum dot layer, and the manufacturing quality of the light-emitting diode chip is further improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor devices, and more particularly, to an epitaxial structure with a quantum dot layer, a manufacturing method thereof, and a light-emitting diode chip. Background technique [0002] In recent years, with the rapid development of light-emitting diode chips based on AlGaInP, the traditional devices with multiple quantum wells as the active region structure are also quite mature. Quaternary system (Al X Ga 1-X ) 0.5 In 0.5 The P material has a wide band gap, and as the Al composition changes in the range of 0 to 0.5, the emission wavelength can vary from 650 nm for red light to 550 nm for yellow-green light. As the wavelength becomes shorter, the Al composition needs to increase continuously, but the increase of Al composition will make the AlGaInP material change from direct band gap to indirect band gap, resulting in lower internal quantum efficiency and lower device brightness. In addition...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/06H01L33/00H01L33/12H01L33/14
Inventor 李晓静伏兵黄璐马英杰蔡和勋
Owner YANGZHOU CHANGELIGHT
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products