Check patentability & draft patents in minutes with Patsnap Eureka AI!

Adaptive evolution method for improving resistance of saccharomyces cerevisiae to 2-pe and chemostat culture device

An adaptive evolution, 2-pe technology, applied in the direction of microorganism-based methods, biochemical cleaning devices, methods using microorganisms, etc., can solve the problems of β-phenylethanol reducing bacterial cell production efficiency and cell damage, and achieve Effects of reducing unfavorable factors and evolutionary pressure, increasing resistance, and improving evolutionary efficiency

Pending Publication Date: 2022-04-15
EAST CHINA UNIV OF SCI & TECH
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the above-mentioned process, Saccharomyces cerevisiae cells will face multiple environmental pressures. First, the accumulation of the product β-phenylethanol will greatly reduce the efficiency of cell production, and at the same time cause irreversible damage to the cell itself

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Adaptive evolution method for improving resistance of saccharomyces cerevisiae to 2-pe and chemostat culture device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application. In addition, it should be understood that the specific implementations described here are only used to illustrate and explain the present application, and are not intended to limit the present application. In this application, unless stated otherwise, the used orientation words such as "up", "down", "left", and "right" usually refer to the upper, lower, and left sides in the actual use or working state of the device. and right, specifically the direction of the drawing in the attached drawing.

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an adaptive evolution method for improving the resistance of saccharomyces cerevisiae to 2-pe and a chemostat culture device, and the method comprises the following steps: inoculating saccharomyces cerevisiae liquid into a first culture medium to form a culture system, and carrying out batch culture; ethanol in the culture system is exhausted, and chemostat culture evolution is carried out; a second culture medium containing beta-phenethyl alcohol with an initial concentration is added into the culture system at a constant rate; fermentation tail gas components are obtained, whether the concentration of beta-phenethyl alcohol needs to be adjusted or not is monitored and judged through the fermentation tail gas components, and the concentration of beta-phenethyl alcohol is gradually increased to the target concentration from the initial concentration in a stepped mode; the method comprises the following steps: obtaining a target strain growing in beta-phenethyl alcohol with a target concentration at a constant specific growth rate, and screening to obtain the saccharomyces cerevisiae strain with high 2-pe resistance. According to the invention, the resistance of the strain to beta-phenethyl alcohol is improved, and the resistance of the strain to a sugar limiting state in a conventional production process is improved.

Description

technical field [0001] The application relates to the field of Saccharomyces cerevisiae and its laboratory adaptive evolution method, in particular to an adaptive evolution method and a chemostat culture device for improving the resistance of Saccharomyces cerevisiae to 2-pe (full name β-phenylethanol). Background technique [0002] β-Phenylethyl alcohol is the most widely used fragrance compound after vanillin. It has a soft, pleasant and long-lasting rose fragrance and is widely used in food, fragrance, cosmetics and other chemical industries. At the same time, β-phenylethanol is also an important taste substance in traditional fermented foods such as liquor, rice wine, sake, fruit wine, wine, soy sauce, bread, and cheese. At present, chemical methods are often used in the world to synthesize β-phenylethanol. According to the relevant laws of the United States and Europe, β-phenylethanol synthesized by microorganisms is a natural fragrance substance, so microbial cell fact...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C12N1/18C12N1/36C12M1/34C12M1/02C12M1/00C12R1/865
CPCC12N1/18C12N1/36C12M27/02C12M29/00C12M33/04C12M41/26C12M41/32C12M41/34
Inventor 杭海峰杨承翰黄隆昊李潇鑫刘吴一邵博宁葛礼豪庄英萍储炬郭美锦
Owner EAST CHINA UNIV OF SCI & TECH
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com