Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Curved fly's-eye lens based on DMD digital photoetching and preparation method of curved fly's-eye lens

A curved surface compound eye and lens technology, which is applied in the field of curved surface compound eye lens and its preparation, can solve the problems of small field of view, cumbersome process, and high cost, and achieve the effects of controllable arc bending, reduced manufacturing difficulty, and improved production efficiency

Pending Publication Date: 2022-04-15
XIHUA UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] During the fabrication of microlens arrays and spherical substrates, different methods can produce varying degrees of process defects and difficulties
For example, in the manufacture of microlens arrays, the method of directly manufacturing microlenses is high in cost and complicated in the preparation process
Manufacturing cost can be reduced by indirect manufacturing of the master and then inversion process. The same master can produce a large number of microlenses, but it is easy to contaminate and damage the master in the inversion process, and the process is cumbersome
Using physical means to change the curvature of the PDMS film to make it into a microlens may lead to the disadvantages of uneven deformation of the same microlens and different degrees of deformation of different microlenses.
Similarly, the above-mentioned problems will also be faced in the production method of curved substrates, resulting in the production of fly-eye lenses with unclear imaging, smaller field of view, and large aberrations.
In addition, most curved fly-eye lenses use flat photosensitive sensors. During the imaging process, there is a mismatch between the focal plane of the curved surface and the flat image surface of the photosensitive component CMOS or CCD, resulting in defocusing.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Curved fly's-eye lens based on DMD digital photoetching and preparation method of curved fly's-eye lens
  • Curved fly's-eye lens based on DMD digital photoetching and preparation method of curved fly's-eye lens
  • Curved fly's-eye lens based on DMD digital photoetching and preparation method of curved fly's-eye lens

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] This embodiment provides a method for preparing a curved fly-eye lens based on DMD digital lithography, comprising the following steps:

[0049] (1) Select a silicon wafer as the substrate, prepare a mixed solution of hydrofluoric acid and hydrogen peroxide at a volume ratio of 10:1, place the silicon wafer in the mixed solution for 2 min, and then rinse the surface of the silicon wafer with flowing deionized water. Then place the silicon wafer in an oven and bake for 5 minutes, so as to completely evaporate excess water and ensure that the surface of the silicon wafer is dry.

[0050] (2) AZ9260 positive photoresist was applied at a speed of 400rpm for 30s, and the thickness of the photoresist layer finally coated on the silicon wafer was about 20 μm. Subsequent pre-baking of the photoresist is carried out, and the process parameters of 120°C / 3min are adopted, that is, the silicon wafer after the uniform glue is placed on a baking plate with a constant temperature of 1...

Embodiment 2

[0068] This embodiment provides a method for preparing a curved fly-eye lens based on DMD digital lithography, comprising the following steps:

[0069] (1) Select a silicon wafer as the substrate, prepare a mixed solution of hydrofluoric acid and hydrogen peroxide at a volume ratio of 10:1.5, soak the silicon wafer in the mixed solution for 1 min, and then rinse the surface of the silicon wafer with flowing deionized water, Then place the silicon wafer in an oven and bake for 8 minutes, so as to completely evaporate excess water and ensure that the surface of the silicon wafer is dry.

[0070] (2) AZ9260 positive photoresist was applied at a speed of 350 rpm for 30 s, and the thickness of the photoresist layer finally coated on the silicon wafer was about 20 μm. Subsequently, the photoresist is pre-baked, and the process parameter of 120°C / 3min is adopted, that is, the silicon wafer after the uniform glue is placed on a baking plate with a constant temperature of 110°C and bak...

Embodiment 3

[0077] This embodiment provides a method for preparing a curved fly-eye lens based on DMD digital lithography, comprising the following steps:

[0078](1) Select a silicon wafer as the substrate, prepare a mixed solution of hydrofluoric acid and hydrogen peroxide at a volume ratio of 10:1, place the silicon wafer in the mixed solution for 2 min, and then rinse the surface of the silicon wafer with flowing deionized water. Then place the silicon wafer in an oven and bake for 10 minutes, so as to completely evaporate excess water and ensure that the surface of the silicon wafer is dry.

[0079] (2) AZ9260 positive photoresist was applied at a speed of 400rpm for 30s, and the thickness of the photoresist layer finally coated on the silicon wafer was about 20 μm. Subsequent pre-baking of the photoresist is carried out, and the process parameters of 120°C / 3min are adopted, that is, the silicon wafer after the uniform glue is placed on a baking plate with a constant temperature of 1...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a curved fly's-eye lens based on DMD digital lithography and a preparation method thereof.The curved fly's-eye lens is of a hemispherical structure, the hemispherical structure sequentially comprises a hemispherical curved focal plane, an elastic film and a curved micro-lens array from inside to outside, all levels of sub-eyes form the curved micro-lens array, and the curved micro-lens array comprises a spherical curved focal plane, an elastic film and a curved micro-lens array. All the levels of sub-eyes comprise a first-level sub-eye located in the center of the curved-surface micro-lens array and a plurality of circles of n-level sub-eyes arranged with the first-level sub-eye as the circle center, wherein n is an integer larger than or equal to 2. A plurality of photosensitive sensors in one-to-one correspondence with the sub-eyes are uniformly arranged on one surface, facing the elastic film, of the hemispherical curved focal plane. According to the invention, three-dimensional photoetching is carried out on the micro-lens structure through digital photoetching of the digital micro-mirror DMD, and the micro-lens array can be obtained only through one-time reverse molding. The aperture and rise of the sub-eye and the curvature radius of the curved fly-eye lens are controllable, the manufactured micro-lens is high in size and surface shape precision and good in surface uniformity, the manufacturing process is simple, and the cost is low.

Description

technical field [0001] The invention belongs to the technical field of fly-eye lenses, and in particular relates to a curved fly-eye lens based on DMD digital photolithography and a preparation method thereof. Background technique [0002] The compound eye of most arthropods is an imaging system with excellent performance. Biological compound eyes are composed of many tiny optical units. These independent sub-eyes are spliced ​​together to form a hemispherical compound eye. Imaging works with full vision capabilities. Compared with traditional optical systems, the field of view is limited by the imaging performance of its own optical components. Only a few optical systems can provide a field of view greater than 90°, which can only provide a larger field of view for static scenes, and the resulting image There is a large distortion in the edge part. The fly eye lens has the advantages of large field of view, low aberration and distortion, and high sensitivity. Inspired by...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B3/00
Inventor 蒋文波王画然
Owner XIHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products