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Power supply and arc treatment method

An arc and power technology, applied in photovoltaic power generation, electrical components, circuit devices, etc., can solve problems such as reducing the quality of coated products, damaging RF power supplies, and increasing the defective rate of coated products.

Active Publication Date: 2022-05-27
深圳市瀚强科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, plasma arcs are easy to generate during the plasma coating process, and the generation of plasma arcs will reduce the quality of coated products, increase the defective rate of coated products, and even damage the RF power supply.

Method used

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  • Power supply and arc treatment method
  • Power supply and arc treatment method
  • Power supply and arc treatment method

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Experimental program
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Embodiment Construction

[0030] The power supply provided in the present application can be applied to various application fields such as the semiconductor field or the photovoltaic manufacturing equipment field, and the specificity can be determined according to the actual application scenario, which is not limited here. The power supply provided in the present application can be adapted to different application scenarios, for example, the application scenario where the power supply is used to supply power for plasma coating in semiconductors, photovoltaic manufacturing equipment (such as coating machines, lithography machines, coating systems, etc.). Here, the power supply can be a radio frequency power supply or other power supply that can generate a sine wave (or other waveform such as a square wave) voltage with a fixed frequency (the frequency is usually in a specific radio frequency range (such as 300kHz to 30GHz)) and has a certain output power. For the convenience of description, an applicatio...

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Abstract

The invention provides a power supply and an electric arc processing method. The power supply comprises a power generation circuit, an electric arc detection circuit and a driving control circuit. The arc detection circuit is used for obtaining a first arc detection power difference based on the output of the power generation circuit detected at a first detection moment and a second detection moment when a target arc is generated, and obtaining a second arc detection power difference based on the output of the power generation circuit detected at the second detection moment and a third detection moment; the arc detection circuit is further used for obtaining the arc type of the target arc based on the first arc detection power difference, the second arc detection power difference and the target detection time interval; and the driving control circuit is used for controlling the power generation circuit to stop outputting voltage and / or current to the load based on the arc extinguishing response duration corresponding to the arc type of the target arc so as to perform arc extinguishing processing. By adopting the method and the device, the arc extinguishing duration can be determined according to the arc type, the misjudgment rate is reduced, the production efficiency is improved, and the production cost is reduced.

Description

technical field [0001] The present application relates to the field of electronic power technology, and in particular, to a power supply and an arc processing method. Background technique [0002] A radio frequency power supply is a power supply that can generate a sine wave voltage at a fixed frequency (the frequency is usually in a specific radio frequency range (such as 300kHz to 30GHz)) and has a certain output power. RF power supply is widely used in semiconductor and photovoltaic manufacturing equipment. RF power supply is the core component of semiconductor and photovoltaic manufacturing equipment. It is suitable for power supply of plasma coating in semiconductor and photovoltaic manufacturing equipment (such as coating machine, lithography machine, coating system, etc.). However, plasma arcs are easily generated during the plasma coating process. The generation of plasma arcs will reduce the quality of coated products, increase the defect rate of coated products, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C16/50H02H1/00H02H3/08
CPCC23C14/325C23C16/50H02H1/0015H02H3/08Y02E10/50
Inventor 陈亚梯赵志浩王绍煦罗超
Owner 深圳市瀚强科技股份有限公司