Method for conducting and blackening continuous non-metal strip
A non-metallic, conductive technology, applied in the direction of metal material coating process, fiber treatment, electrical components, etc., can solve the problems of decreased conductivity and aesthetics, easy oxidation and discoloration of the surface, poor decoration, etc., to achieve beautiful decorative effects, Good wear and corrosion resistance, high hardness
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Embodiment 1
[0022] A continuous polyester polyurethane foam sponge is used as the substrate. The average pore diameter of the selected sponge is 200 μm and the thickness is 0.5 mm. First, a layer of Ni is deposited on the substrate by vacuum magnetron sputtering technology as a conductive metal layer. The average thickness of the layer is 500 nm, and the process parameters used in the magnetron sputtering process are: the strip travel speed is 0.1 m / min, the target width per decimeter is 0.6 kilowatts, and the applied target power density is 0.6 kW. A Ni-Sn blackened conductive layer is formed on the conductive metal layer obtained by irradiating through an electrodeposition process, and the average thickness of the blackened conductive layer is 5 nm, thereby obtaining a continuous non-metallic strip with surface conductive and blackening treatment.
Embodiment 2
[0024] A continuous polyether polyurethane foam sponge is used as the substrate. The average pore diameter of the selected sponge is 1000 μm and the thickness is 7.0 mm. First, a layer of Ni-Cu alloy is deposited on the substrate by vacuum magnetron sputtering technology as a conductive metal layer. , the average thickness of the conductive metal layer is 300nm, the process parameters used in the magnetron sputtering process are: the strip speed is 10 m / min, the target power density applied per decimeter target width is 0.8 kW, and then the magnetic On the conductive metal layer obtained by controlled sputtering, a composite blackened conductive layer composed of two types of blackened conductive layers, Ni-Zn and Ni-Sn-S, was formed by two electrodeposition processes. The average thickness of the composite blackened conductive layer was 500 nm. Thereby, a continuous non-metallic strip with surface conductive and blackening treatment is obtained.
Embodiment 3
[0026] A continuous non-woven fabric is used as the substrate, and the thickness of the selected non-woven fabric is 0.02 mm. First, a layer of Cu is deposited on the substrate as a conductive metal layer by vacuum magnetron sputtering technology. The average thickness of the conductive metal layer is 50 nm. The process parameters used in the controlled sputtering process are: the speed of the strip is 20 m / min, the target power density applied per decimeter target width is 1 kilowatt, and then the conductive metal layer obtained by magnetron sputtering is passed through two The secondary electrodeposition process forms a composite blackened conductive layer composed of two types of blackened conductive layers, Ni-Cu-Sn and Ni-Zn-S, and the average thickness of the composite blackened conductive layer is 300nm, thereby obtaining a surface conductive and black conductive layer. Processed continuous non-metallic strip.
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