High-precision asymmetric bipolar pulse power supply system

Abstract

The invention discloses a high-precision asymmetric bipolar pulse power supply system which can accurately control output power and can provide a positive pulse at a rising edge of a negative pulse, and the size and width of the positive pulse are adjustable. The phase-shift inverter comprises a phase-shift inverter full-bridge circuit, the phase-shift inverter full-bridge circuit inverts direct current into high-frequency alternating current, the inverter frequency and the phase-shift angle are adjusted in real time according to set and feedback signals, and the output power is accurately controlled in real time; in a period of time before the IGBT of the chopper circuit is turned off, the IGBT of the reverse polarity circuit is turned on to charge the current transformer; after the IGBT of the chopper circuit is turned off for a period of time and before the next pulse of the chopper circuit comes, the IGBT of the reverse polarity circuit is turned off. The problem of low control precision of a high-power high-density magnetron sputtering power supply is effectively solved, the sparking probability of the vacuum chamber is reduced, and the problems of arc target poisoning and anode disappearance are inhibited.

Description

technical field [0001] The invention relates to a power module, in particular, to a high-precision asymmetric bipolar pulse power supply based on a vacuum magnetron sputtering process. Background technique [0002] The research on PVD coating plasma power supply at home and abroad is relatively mature, but there are still some problems to be solved. Such as vacuum chamber ignition, cathode poisoning, anode disappearance, low power linear adjustment accuracy and so on. [0003] The magnetron sputtering process requires the magnetron sputtering power supply to rapidly ionize the working gas to form a stable plasma, and to form a stable incident ion flow on the surface of the target. Magnetron sputtering power supply is divided into two types: DC power supply and pulse power supply. Problems such as target poisoning, anode disappearance, and discharge arcing are prone to occur when DC power supply is used to prepare thin films. The pulse power supply is divided into a unipol...

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the shortcomings of the prior art, to precisely control the output power, to provide a positive pulse on the rising edge of the negative pulse, the size and width of the positive pulse are adjustable, and to effectively solve the problem of high-power high-density magnetron sputtering. The problem of low power control accuracy reduces the probability of ignition in the vacuum chamber, and suppresses the problems of arc target poisoning and anode disappearance

Images