Hybrid carrier control device
A technology for controlling devices and carriers, which is applied to semiconductor devices, electrical components, circuits, etc., can solve the problems of poor trade-off relationship of thyristor conduction voltage drop, poor practicability, weak anti-electromagnetic interference ability, etc., and achieve anti-electromagnetic interference ability Strong, performance-enhancing, conflict-solving effects
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Embodiment 1
[0044] The present invention provides a hybrid carrier control device, which includes a main working unit and at least one depletion-mode PMOS structure; the main working unit includes a gate-controlled region and a thyristor region, the gate-controlled region, the depletion-mode PMOS structure The regions and the thyristor regions are arranged from top to bottom, and the depletion-mode PMOS structures are arranged in parallel in an adjacent form.
[0045] In this embodiment, the gate control region includes a first electrode 111, a first insulating material 201, a second electrode 121, a second insulating material 211, a fourth electrode 141, a fourth electrode heavily doped ohmic contact region 301, and a fourth electrode Four-electrode base region 401;
[0046] The first electrode 111 is disposed in the first insulating material 201 , the second electrode 121 is disposed in the second insulating material 211 , and the fourth electrode base region 401 is disposed in the four...
Embodiment 2
[0060] like figure 2 As shown, the present invention provides a hybrid carrier control device, including a main working unit and two depletion-mode PMOS structures; the main working unit includes a gate control region and a thyristor region, the gate control region, the consumption The depletion PMOS region and the thyristor region are arranged from top to bottom, and the two depletion PMOS structures are arranged in parallel in an adjacent form.
[0061] In this embodiment, the gate control region includes a first electrode 111, a first insulating material 201, a second electrode 121, a second insulating material 211, a fourth electrode 141, a fourth electrode heavily doped ohmic contact region 301, and a fourth electrode The base region 401; the first electrode 111 is arranged in the first insulating material 201; the second electrode 121 is arranged in the second insulating material 211; the fourth electrode 141 is arranged between the first insulating material 201 and the...
Embodiment 3
[0075] like Figure 7 As shown, the present invention provides a hybrid carrier control device, which includes a main working unit and three depletion-mode PMOS structures; the main working unit and the depletion-mode PMOS structure are respectively arranged in the MOS gated thyristor Both ends; the main working unit includes a gated region and a thyristor region, the gated region, the depletion-mode PMOS region and the thyristor region are arranged from top to bottom, and the depletion-mode PMOS structures are juxtaposed in an adjacent form set up.
[0076] In this embodiment, the gate control region includes a first electrode 111, a first insulating material 201, a second electrode 121, a second insulating material 211, a fourth electrode 141, a fourth electrode heavily doped ohmic contact region 301, and a fourth electrode Four-electrode base region 401; the first electrode 111 is disposed in the first insulating material 201, the second electrode 121 is disposed in the se...
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Abstract
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