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Molybdenum trioxide sputtering target material, preparation method and target material mold

A molybdenum trioxide and sputtering target technology is used in the preparation of sputtering targets, molybdenum trioxide sputtering targets, target molds, and preparation fields. Actual demand and other issues, to achieve the effect of reducing production cycle and production cost, improving formability and yield, and ensuring high purity

Pending Publication Date: 2022-07-12
JINDUICHENG MOLYBDENUM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies in the prior art, the object of the present invention is to provide a molybdenum trioxide sputtering target, a preparation method and a target mold to solve the problem in the prior art that the density and purity of the sputtering target are low and difficult to Technical issues that meet actual needs

Method used

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  • Molybdenum trioxide sputtering target material, preparation method and target material mold
  • Molybdenum trioxide sputtering target material, preparation method and target material mold
  • Molybdenum trioxide sputtering target material, preparation method and target material mold

Examples

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Effect test

Embodiment 1

[0063] This embodiment provides a target mold, such as Figure 1 to Figure 4 As shown, it includes a female mold sleeve 1, the top and bottom ends of the female mold mold sleeve 1 are open, the top end of the female mold mold sleeve 1 is provided with a male mold 2, and the bottom end of the female mold mold sleeve 1 is provided with a female mold base 3;

[0064] The female mold sleeve 1 is provided with a plurality of graphite separators 4, and the plurality of graphite separators 4 are evenly arranged along the vertical direction; the space enclosed by the female mold sleeve 1, the male mold 2 and the female mold base 3 is separated by graphite. The plate 4 is divided into multi-layer spaces, and each layer space is a powder filling cavity 5 .

[0065] As a specific solution in this embodiment, the inner surface of the female mold sleeve 1 and the top surface of the female mold base 3 are provided with embedded graphite plates 6, which can ensure smooth demolding.

[0066...

Embodiment 2

[0070] This example provides a method for preparing a molybdenum trioxide sputtering target. The spherical molybdenum trioxide powder is put into the target mold of Example 1, and after hydraulic pressing, hot pressing and processing in sequence, the A molybdenum trioxide sputtering target is obtained; the method specifically comprises the following steps:

[0071] Step 1, prepare spherical molybdenum trioxide powder;

[0072] Using 25g / mL molybdenum trioxide powder solution as raw material, spray granulation using a spray granulator to obtain spherical molybdenum trioxide powder; the conditions for spray granulation are that the rotational speed of the atomizer of the spray granulator is 10000 rpm, the rotational speed of the peristaltic pump of the spray granulator is 200 rpm, the inlet temperature of the working chamber of the spray granulator is 400°C, and the outlet temperature of the working chamber of the spray granulator is 80°C.

[0073] Step 2, target mold filling; ...

Embodiment 3

[0083] This example provides a method for preparing a molybdenum trioxide sputtering target. The spherical molybdenum trioxide powder is put into the target mold of Example 1, and after hydraulic pressing, hot pressing and processing in sequence, the A molybdenum trioxide sputtering target is obtained; the method specifically comprises the following steps:

[0084] Step 1, prepare spherical molybdenum trioxide powder;

[0085] Using 50g / mL molybdenum trioxide powder solution as raw material, spray granulation by spray granulator to obtain spherical molybdenum trioxide powder; the condition of spray granulation is that the rotational speed of the atomizer of the spray granulator is 20000 rpm, the rotational speed of the peristaltic pump of the spray granulator is 200 rpm, the air inlet temperature of the working chamber of the spray granulator is 300°C, and the outlet temperature of the working chamber of the spray granulator is 200°C.

[0086] In this embodiment, step 2 is ba...

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Abstract

The invention provides a molybdenum trioxide sputtering target material, a preparation method and a target material mold. The preparation method comprises the following steps: carrying out spray granulation on a molybdenum trioxide powder solution serving as a raw material to prepare spheroidic molybdenum trioxide powder, filling the spheroidic molybdenum trioxide powder into a target mold, and sequentially carrying out hydraulic pressing, hot pressing treatment and processing treatment to prepare the molybdenum trioxide sputtering target, the purity of the molybdenum trioxide sputtering target is greater than 99.95%, and the molybdenum trioxide sputtering target can be used for preparing the molybdenum trioxide sputtering target. And the density is greater than 99.5%. According to the preparation method of the molybdenum trioxide sputtering target material, a process of combining spray granulation and hot pressing is adopted, and a specially-made target material mold is matched, so that the finally prepared high-purity and high-density molybdenum trioxide sputtering target material can meet actual requirements.

Description

technical field [0001] The invention belongs to the technical field of target material preparation, relates to the preparation of sputtering target material, and in particular relates to a molybdenum trioxide sputtering target material, a preparation method and a target material mold. Background technique [0002] In recent years, electrochromic materials are considered to be one of the most promising smart materials, among which electrochromic thin films are one of the most promising electrochromic materials. Electrochromic thin films can be used to make smart windows, flat surfaces Display, laser printing smart windows, etc. Molybdenum trioxide thin films have attracted more and more attention due to their good electrochromic and photochromic properties. At the same time, sputtering coating technology is one of the important technical means for preparing thin film materials due to its advantages of fast deposition speed, high film formation uniformity, good process repeat...

Claims

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Application Information

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IPC IPC(8): C23C14/34C04B35/495C04B35/622C04B35/645C04B35/626
CPCC23C14/3414C23C14/3407C04B35/495C04B35/622C04B35/645C04B35/62695C04B2235/77C04B2235/96
Inventor 席莎崔玉青周莎朱琦杨秦莉张晓李晶
Owner JINDUICHENG MOLYBDENUM CO LTD