Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for measuring complex refractive index of two-dimensional material

A complex refractive index, two-dimensional material technology, applied in the field of ion resonance holographic microscopy to measure the complex refractive index of two-dimensional materials, can solve the influence of complex refractive index measurement results, the inability to compensate for refractive index shift, and the inconsistency of time stability. Advanced problems, to avoid environmental impact, high sensitivity, simple operation

Pending Publication Date: 2022-08-05
NORTHWESTERN POLYTECHNICAL UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this measurement method, the refractive index shift caused by the volatilization of ethanol-water solution cannot be compensated, which will affect the measurement results of the complex refractive index, and the experimental measurement process involved is relatively time-consuming and the time stability is not high.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for measuring complex refractive index of two-dimensional material
  • Method for measuring complex refractive index of two-dimensional material
  • Method for measuring complex refractive index of two-dimensional material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The present invention will now be further described in conjunction with the embodiments and accompanying drawings:

[0019] The invention relates to a surface plasmon resonance holographic microscope system combined with an angle scanning device such as figure 1 As shown, including He-Ne laser 1, fiber coupling device 2, collimating lens 3, half-wave plate 4, converging lens 5, depolarization beam splitter prism (connected to electronically controlled displacement stage) 6, oil immersion objective lens 7, surface plasmon Resonant excitation structure 8 , imaging lens 9 , Wollaston prism 10 , polarizer 11 , and image acquisition device 12 .

[0020] The working principle of the method for measuring the complex refractive index of two-dimensional materials is as follows:

[0021] When surface plasmon resonance occurs, if the thickness, refractive index, and incident light wavelength of each layer of the medium in the excitation structure are determined, small changes in ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for measuring the complex refractive index of a two-dimensional material. The complex refractive index parameter of the two-dimensional material is measured with high sensitivity through surface plasma resonance holographic microscopy based on angle scanning. The complex refractive index parameter of the two-dimensional material in the near-field region of the metal surface determines a resonance curve that the reflection phase shift changes along with the incident angle of the exciting light near the excitation angle in the surface plasma resonance process, the real part of the complex refractive index determines the position of the resonance curve, and the imaginary part determines the slope of the resonance curve. Reflection light wave phase values under different incidence angles are measured by using a secondary exposure digital holographic interferometry, and high-sensitivity measurement of complex refractive index parameters of a two-dimensional material sample can be realized.

Description

technical field [0001] The invention relates to the field of optical precision measurement, in particular to a method for measuring the complex refractive index of two-dimensional materials by using angle scanning surface plasmon resonance holographic microscopy. Background technique [0002] Two-dimensional materials are structural materials with atomic layer thickness, which are widely studied and applied due to their high carrier mobility, high thermal conductivity, high mechanical strength, and adjustable band gap. The complex refractive index is an important optical parameter of two-dimensional materials, and its accurate measurement and characterization is of great significance in the research and application of two-dimensional materials. Wang et al. measured the complex refractive index of graphene at different wavelengths using picometry, but the operation and calculation process are complicated (X.Wang, et al. “Strong anomalousoptical dispersion of graphene: complex...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/41
CPCG01N21/41
Inventor 赵建林米婧宇张继巍邸江磊
Owner NORTHWESTERN POLYTECHNICAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com