Unlock instant, AI-driven research and patent intelligence for your innovation.

High-sensitivity Raman enhanced substrate for rapid detection and preparation method thereof

A high-sensitivity, substrate-based technology, applied in Raman scattering, measurement devices, material excitation analysis, etc., can solve the problems of inhomogeneity, difficult positioning, and reduced detection performance, and meet the requirements of reducing the accuracy of dropping samples, processing Convenient and fast, high processing efficiency

Pending Publication Date: 2022-08-09
SHENZHEN TECH UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing super-hydrophobic surface-enhanced Raman substrate has low adhesion, and the sliding of the droplet leads to the randomness of the molecular deposition position, making it difficult to directly and quickly locate the target molecular deposition position.
In addition, due to the single-period structure of the low-adhesion superhydrophobic surface, it is difficult to quickly capture trace amounts of colorless deposits even with microscopic Raman equipment.
In addition, on hybrid superhydrophobic / superhydrophilic substrates, the central region of the superhydrophilic pattern can still detect the residue of target molecules.
At the same time, the size of the superhydrophilic pattern cannot be reduced indefinitely, resulting in a decrease in detection performance.
In addition, most traditional methods based on chemical synthesis or complex lithography routes, such as focused ion beam and electron beam lithography, suffer from non-uniformity or low throughput

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-sensitivity Raman enhanced substrate for rapid detection and preparation method thereof
  • High-sensitivity Raman enhanced substrate for rapid detection and preparation method thereof
  • High-sensitivity Raman enhanced substrate for rapid detection and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.

[0025] like Figure 1-5 As shown, the present invention provides a high-sensitivity Raman-enhanced substrate for rapid detection, comprising a metal substrate 1, and the surface of the metal substrate 1 is prepared with a micropore array, a superhydrophobic region 3 and a superhydrophilic region 4 The micropore array is composed of several micropores 2, and the diameter of the micropores 2 ranges from 200 microns to 400 microns; The ring width of region 4 ranges from 40 μm to 100 μm; the remaining regions are superhydrophobic regions 3 .

[0026] The present invention also provides the above-mentioned preparation method of the high-sensitivity Raman-enhanced substrate for rapid detection, which specifically includes the following steps:

[0027] (1) Prepare a metal base 1. The material of the metal base 1 includes but is not limited t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention provides a high-sensitivity Raman enhanced substrate for rapid detection. The high-sensitivity Raman enhanced substrate comprises a metal substrate, and a micropore array, a super-hydrophobic area and a super-hydrophilic area are prepared on the surface of the metal substrate; the micropore array is composed of a plurality of micropores, the peripheral annular area of the micropores is a super-hydrophilic area, and the other areas are super-hydrophobic areas. According to the method, the surface of the metal material is ablated by high-power ultrafast pulse laser to form a periodic micro-nano structure, the super-hydrophobic, super-hydrophilic and microporous mixed metal surface is prepared in cooperation with a surface modifier of a low-free-energy substance, the process is simple, implementation is easy, and good flexibility and designability are achieved. The Raman substrate provided by the invention has unique advantages in the aspects of attraction anchoring, enrichment effect and low sample dosage, and can directly and quickly locate the deposition position of a target to-be-detected molecule during detection. The invention also provides a preparation method of the high-sensitivity Raman enhanced substrate for rapid detection.

Description

technical field [0001] The invention relates to a Raman-enhanced substrate, in particular to a high-sensitivity Raman-enhanced substrate for rapid detection and a preparation method thereof. Background technique [0002] Ultratrace molecular detection has shown its potential in environmental monitoring, precancer diagnosis, food safety, etc., and will be more promising in early disease diagnosis. Among various analytical techniques, Surface Enhanced Raman Scattering (SERS) is becoming one of the cutting-edge techniques for tracking molecules at very low concentrations due to its fast, high sensitivity and non-destructive advantages. Existing surface Raman-enhanced substrates are roughly divided into: hydrophilic substrates, superhydrophobic substrates, and mixed superhydrophobic / superhydrophilic substrates. However, the existing superhydrophobic surface-enhanced Raman substrates have low adhesion, and the sliding of droplets leads to random molecular deposition positions, m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/65G01N21/01
CPCG01N21/658G01N21/01
Inventor 杨焕余建吴建根王萌伍叶全李春波杨灿
Owner SHENZHEN TECH UNIV