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Method for preparing template with macro nanometer sequential holes

A nano-hole and large-size technology, which is applied in the field of preparation of large-size nano-ordered hole templates, can solve the problems of unobtainable and long nano-holes, and achieve the effects of easy depth, low processing cost and reliable process

Inactive Publication Date: 2004-06-30
NANJING UNIV
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  • Summary
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  • Claims
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AI Technical Summary

Problems solved by technology

The existing compression molding technology, photolithography and electron beam etching technology can obtain large-area nano-ordered hole templates, but cannot obtain long nano-holes with uniform diameters
The direct anodic oxidation method can only obtain small-area ordered nanohole templates

Method used

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  • Method for preparing template with macro nanometer sequential holes
  • Method for preparing template with macro nanometer sequential holes

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Embodiment Construction

[0007] Below according to accompanying drawing and embodiment the present invention will be further described:

[0008] The embodiment of the method of the present invention: the embodiment of preparing large-scale nano-ordered hole templates on metal aluminum or aluminum alloy is divided into three steps, the first step is to produce hexagonal symmetrical large-area nano-ordered patterns; the second step is to perform electrochemical anode Oxidation, the third step is to adjust the diameter of the hole through the action of the hole-enlarging fluid.

[0009] There are three options for the first step,

[0010] 1. A mother board is made of silicon carbide, single crystal silicon or other materials, and nano-columns with uniform diameters are distributed symmetrically in a hexagonal manner on the board. Cover a layer of polymer material film (such as PMMA) on a flat aluminum (or aluminum alloy) substrate, and use polycool film, etc., to press the mother board on the polymer ma...

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Abstract

A preparation method of large-size nanometer ordered orifice template is that a large area ordered pattern is formed on surface of metal aluminium, aluminium alloy or single-crystal aluminium, then the anode oxidation method is used to form large area ordered nanometer orifice template on aluminium or aluminium allog. Single crystal aluminium is used as substrate, and the anode oxidation is directly proceeded. The present invention can produce nanometer orifice template with high-density large area hexagonal symmetrical ordered long orifice and it can also produce ordered nanometer pipe, bar, etc..

Description

1. Technical field [0001] The invention relates to a method for preparing nano-ordered holes, in particular to a method for preparing a large-scale nano-ordered hole template. 2. Background technology [0002] Large-scale nano-ordered hole templates can be very well applied. For example, it is used for new magnetic recording disk substrates, etc. The existing compression molding technology, photolithography and electron beam etching technology can obtain large-area nano-ordered hole templates, but cannot obtain long nano-holes with uniform diameters. The direct anodic oxidation method can only obtain small-area ordered nanohole templates. 3. Contents of the invention [0003] The object of the present invention is to propose a method for preparing a large-scale nano-ordered hole template, to obtain a large-area nano-ordered hole template, and to obtain long nano-holes with uniform diameters. The object of the present invention is also to provide a preparation method wit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D11/02C25D11/04
Inventor 杨绍光朱浩都有为
Owner NANJING UNIV
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