Method for preparing template with macro nanometer sequential holes
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NANJING UNIV
- Publication Date
- 2004-06-30
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
1. Technical field
[0001] The invention relates to a method for preparing nano-ordered holes, in particular to a method for preparing a large-scale nano-ordered hole template. 2. Background technology
[0002] Large-scale nano-ordered hole templates can be very well applied. For example, it is used for new magnetic recording disk substrates, etc. The existing compression molding technology, photolithography and electron beam etching technology can obtain large-area nano-ordered hole templates, but cannot obtain long nano-holes with uniform diameters. The direct anodic oxidation method can only obtain small-area ordered nanohole templates. 3. Contents of the invention
[0003] The object of the present invention is to propose a method for preparing a large-scale nano-ordered hole template, to obtain a large-area nano-ordered hole template, and to obtain long nano-holes with uniform diameters. The object of the present invention is also to provide a preparation method wit...