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Method for producing grey mask

A technology of gray-tone mask and manufacturing method, which is applied in the photoengraving process of the pattern surface, the manufacture of semiconductor/solid-state devices, the original for opto-mechanical processing, etc. Calibrate offsets, reduce time, ensure quality results

Inactive Publication Date: 2006-11-08
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, even with this method, although there is a difference in the degree of offset compared to the previous method, it cannot solve the problem of graphic offset

Method used

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  • Method for producing grey mask
  • Method for producing grey mask
  • Method for producing grey mask

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Embodiment Construction

[0038] Embodiments of the present invention will be described in detail below.

[0039] figure 1 It shows the first embodiment of the manufacturing method of the gray tone mask of this invention, and is a schematic cross-sectional view showing the manufacturing process in order of process.

[0040] The mask blank used in this embodiment is as figure 1 As shown in (a), a light semitransmissive film 22 and a light shielding film 23 are sequentially formed on a transparent substrate 21 such as quartz. Here, as the material of the light-shielding film 23, a thin film and a material capable of obtaining high light-shielding properties are preferable, and examples thereof include Cr, Si, W, Al, and the like. In addition, as the material of the semi-transmissive film 22, a thin film is preferred and a semi-transmissive material with a transmittance of about 50% can be obtained when the transmittance of the light-shielding portion is 0%. For example, Cr compounds (Cr oxides, nitr...

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Abstract

An object of the present invention is to provide a method for manufacturing a gray tone mask in halftone film type being capable of manufacturing TFT in high quality. Means of achieving the above object is a method comprising the steps of preparing a mask blank having a translucent film (22) and a light-shielding film (23) sequentially formed on a transparent substrate (21), forming a resist film onto said mask blank and exposing the resist film, which includes exposing a partition forming a translucent part to a pattern below resolution limit of a exposing device for pattern-exposing on said resist film, carrying out development to form a resist pattern (24a) which is different in film residue value between a partition forming light-shielding part and a partition forming translucent part, forming a transparent part by etching the light-shielding film (23) and translucent film (22) with said resist pattern (24a) as a mask, removing only resist pattern remained on the translucent part, and forming a translucent part by etching light-shielding film (23a) with remained resist pattern as a mask.

Description

technical field [0001] The present invention relates to a method for manufacturing a graytone mask (graytonemask) suitable for manufacturing a thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display: hereinafter referred to as TFT-LCD). Background technique [0002] Compared with CRT (cathode ray tube), TFT-LCD has the advantages of easy thinning and low power consumption, so it is currently being commercialized rapidly. TFT-LCD has a TFT substrate with a structure in which TFTs are arranged in each pixel arranged in a matrix, and a color filter in which red, green, and blue pixel patterns are superimposed and arranged corresponding to each pixel through a liquid crystal phase. . In the TFT-LCD, the number of manufacturing steps is large, and it is necessary to use 5 to 6 photomasks even to manufacture the TFT substrate. [0003] Under such circumstances, a method of manufacturing a TFT substrate using four photomasks has been proposed (for...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/14G03F7/20H01L21/00G03F1/68G03F1/80H01L21/027
CPCG02F1/1335G03F1/32G03F1/34G03F1/50G03F1/54G03F1/80
Inventor 井村和久
Owner HOYA CORP
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