Method for making strong-limitation multi-mode interference coupler based on rib waveguide

Abstract

A manufacturing method of a strongly confinement multimode interference coupler based on a ridge optical waveguide, characterized in that the following steps are taken: (1) After designing the layout according to the device parameters, adding additional graphics in the gaps in the regions that need to be deeply etched, Reduce the etched area of ​​the area that needs to be deeply etched, increase the difference in the size of the etched area between the area that needs to be deeply etched and the area that requires shallow etching, and the unevenness of the layout, and add additional graphics in the area that needs to produce a tapered waveguide, The size of the etched area of ​​the tapered waveguide region gradually changes along the direction of the waveguide; (2) plate-making photolithography; (3) reactive ion etching; (4) covering the surface of the waveguide with a cladding layer to complete the subsequent manufacturing process.

Description

technical field [0001] The invention relates to reactive ion etching technology, in particular to manufacturing a strong confinement multi-mode interference (MMI) coupler based on ridge optical waveguide by using reactive ion etching technology. Background technique [0002] Coupler / beam splitter is the most basic device in integrated optics and the basis of photonic integrated devices. They can be used as basic devices for optical signal processing and routing, and can also constitute other more complex devices. The coupler / beam splitter can be divided into Y branch, X branch, directional coupler, star coupler, MMI coupler, etc. from the realization structure and method. Among them, the MMI coupler uses the self-image principle of light to realize the coupling / beam splitting function, because the MMI coupler has a compact structure, large longitudinal manufacturing tolerance, low loss, large bandwidth, insensitive to polarization, and easy to achieve large-scale Integrati...

AI Technical Summary

Problems solved by technology

However, the manufacturing process of the MMI coupler is relatively difficult due to strong limitations. Generally, two or more photolithography and etching are required, and high alignment accuracy is required during the second photolithography.

The tapered waveguide region used to reduce transmission loss and connect deep and shallow etched regions is particularly difficult to fabricate, which is difficult to achieve using traditional photolithography processes

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