Operation process of semiconductor device
A working method and semiconductor technology, applied in the fields of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., can solve the problems of lack of stability, large footprint and space, and high cost, and achieve solderless integration. , easy to make, high stability effect
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[0038] figure 1 A schematic diagram of a polysilicon resistor on a substrate for illustrating the first embodiment of the present invention.
[0039] exist figure 1 Reference numeral 1 in the figure denotes a silicon substrate on which an insulating layer 5 such as silicon dioxide is coated. A long hexahedron-shaped polysilicon strip with a length of 1, a width of b, and a height of h is arranged on the insulating layer. The polysilicon strip is denoted by 10 . The production process of such polysilicon strips is known from the prior art. For example, chemical vapor deposition methods (CVD) and subsequent structuring of the doped polysilicon can be used. For example, the height h of polysilicon resistance strips realized by known process technology is 0.15 μm, the width b is several μm, and the length 1 is in the range of tens of μm.
[0040] Depending, for example, on the degree of doping with boron, arsenic, phosphorus, etc., the layer resistance of the deposited polysil...
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