Method of producing polysilicon with mixed source of trichloro-hydrosilicon and silicon tetrachloride
A technology of silicon tetrachloride and trichlorosilane, applied in the direction of silicon, etc., can solve the problems of low production rate, low conversion rate, high energy consumption, etc., and achieve the goal of ensuring growth uniformity, quality and yield, and reducing costs Effect
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[0015] See attached figure 1 , First, pass the raw material HCl into SiHCl containing industrial silicon powder 3 In the synthesis furnace (fluidized bed), crude SiHCl is produced 3 And SiCl 4 . Then, on the one hand, the crude SiHCl 3 And SiCl 4 Enter SiHCl 3 And SiCl 4 Refining and purifying in the purification tower to remove unqualified waste SiCl 4 And SiHCl 3 , SiHCl with a purity of 9 or more 3 And SiCl 4 Enter the volatilizer. SiHCl on the other hand 3 H produced in the synthesis furnace 2 And residual HCl enter the separator to separate the waste HCl and the remaining H 2 Join H 2 H from station 2 Let's enter H together 2 Purification device, purification to 6 9 H 2 Also enter the volatilizer. Next, the SiHCl that meets the purity in the volatilizer 3 And SiCl 4 And H 2 The gas is sprayed into the reduction furnace at a regular flow rate to carry out the hydrogen reduction reaction. The reduction temperature is controlled at 1150°C, which is slightly higher than the pure ...
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