Horizontal type detector of atom force microscope

An atomic force microscope, horizontal technology, applied in the field of atomic force microscope probes, can solve the problems of restricting the popularization and application of AFM, restricting the development and popularization of nanotechnology, and expensive operation requirements, etc., and it is easy to realize the technical conditions, good nanometer detection and imaging performance, Improvement of action efficiency and accuracy

Inactive Publication Date: 2003-10-01
ZHEJIANG UNIV
View PDF0 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the performance of imported instruments has become more and more perfect, it is undeniable that the high price of such instruments, strict operating requirements, and dependence on some

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Horizontal type detector of atom force microscope
  • Horizontal type detector of atom force microscope
  • Horizontal type detector of atom force microscope

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0009] The core component of the atomic force microscope is a probe composed of a scanning and feedback controller and a photoelectric detection system, which directly affects the detection resolution, detection accuracy, scanning range, and signal-to-noise ratio of the atomic force microscope. The purpose of the present invention is to invent a horizontal atomic force microscope probe, so that the atomic force microscope system can obtain better nanometer detection performance.

[0010] figure 1 Shown is a schematic diagram of the working principle of a horizontal atomic force microscope. The horizontal atomic force microscope probe of the present invention includes two parts: a scanning and feedback controller 1 composed of XYZ piezoelectric ceramics and a sample stage, and a photoelectric detection system 2 composed of a microcantilever probe, a laser and a position sensitive device (PSD). . AFM uses a microcantilever that is extremely sensitive to weak forces as a force ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A probe of horizontal atomic microscope includes a scan and feedback controller consisting of XiY and Z piezoelectric ceramics and specimen table, and a photoelectric detection system composed of microcantilever probe, laser and position-sensitive device (PSD). Its advantages are simple structure, and high efficiency and precision of atomic force as there is no influence of gravitation to atomic force.

Description

technical field [0001] The invention relates to an atomic force microscope probe used for nanometer detection of micro / nano materials and devices, in particular to a horizontal atomic force microscope probe. Background technique [0002] Nanotechnology is a high-tech developed in the 1980s. All developed countries regard nanotechnology as the core of the new industrial revolution in the 21st century, and my country also lists nanotechnology as a priority development field in its scientific and technological development strategy. Scanning Probe Microscopy (SPM) technology and nano-detection technology represented by Scanning Tunneling Microscope (STM) and Atomic Force Microscope (AFM) are the important basis for the development of nanotechnology. In the SPM family, the application field of AFM is more extensive, because most nanomaterials are non-conductor samples. At present, the application of AFM instruments is more popular in the world, while our c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G12B21/08
CPCG01Q60/38
Inventor 张冬仙章海军
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap