Process for preparing titanium dioxide film on metal Ti surface and Ti plate with titanium dioxide film coated surface prepared thereby

A technology of titanium dioxide and nano-titanium dioxide, which is applied in chemical instruments and methods, catalyst activation/preparation, metal material coating technology, etc., can solve the problems of titanium dioxide grain growth and specific surface area reduction, and achieve good crystallization and low cost , the effect of simple method

Inactive Publication Date: 2004-11-10
甘宪
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Problems solved by technology

This high-temperature heat treatment will inevitably cause the gra

Method used

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  • Process for preparing titanium dioxide film on metal Ti surface and Ti plate with titanium dioxide film coated surface prepared thereby
  • Process for preparing titanium dioxide film on metal Ti surface and Ti plate with titanium dioxide film coated surface prepared thereby
  • Process for preparing titanium dioxide film on metal Ti surface and Ti plate with titanium dioxide film coated surface prepared thereby

Examples

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Embodiment 1

[0055] Example 1: Preparation of pure anatase crystal nano-titanium dioxide film on the surface of titanium sheet

[0056] The size of step 1 is 5×5×0.01(cm 3 ) The surface of the metal titanium plate is pickled with 10% (mass percentage) HF acid at room temperature, and then cleaned with water;

[0057] Step 2: immerse in 50 ml of 30% (mass percent) hydrogen peroxide solution, and react at 80° C. for 72 hours. Reaction result: The surface of the titanium plate uniformly produces a pure anatase crystal nanometer with a thickness of about 3 μm (calculated according to Table 1, and using a scanning electron microscope to observe and measure the morphology, the following examples are the same), and a grain size of about 10 nm. Titanium dioxide film (see figure 1 and 2 ). At the same time, about 37.7 mg of uniform titania nanorods with a diameter of about 20 nm and a length of about 100 nm were precipitated in the solution.

[0058] Table 1: Theoretical calculation...

Embodiment 2

[0077] Embodiment 2: Preparation of pure anatase crystal nano-titanium dioxide film on the surface of titanium sheet

[0078] The size of step 1 is 5×5×0.01(cm 3 ) The surface of the metal titanium plate is pickled with 10% (mass percentage) HF acid at room temperature, and then cleaned with water;

[0079] Step 2: immerse in 50 ml of 30% (mass percent) hydrogen peroxide solution, react at 80° C. for 48 hours, and prepare a titanium sheet covered with a pure anatase crystal nano-titanium dioxide film on the surface. The film grain size is about 10 nm, see image 3 .

Embodiment 3

[0080] Example 3: Preparation of pure anatase crystal nano-titanium dioxide film on the surface of titanium sheet

[0081] The size of step 1 is 5×5×0.01(cm 3 ) The surface of the metal titanium plate is pickled with 10% (mass percentage) HF acid at room temperature, and then cleaned with water;

[0082] Step 2: immerse in 50 ml of 30% (mass percent) hydrogen peroxide solution, react at 80° C. for 24 hours, and prepare a titanium sheet covered with a pure anatase crystal nano-titanium dioxide film on the surface. The film grain size is about 10 nm, see Figure 4 .

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Abstract

The invention is a method of preparing TiO2 film on metallic Ti surface, after washing Ti surface, soaking Ti in 60-90 deg.C 12-30m%-concentration hydrogen peroxide water solution for 24-72 hours, thus preparing an anatase crystal shaped nano TiO2 film. The prepared Ti sheet or plate covered with the nano TiO2 film: the film binds with the Ti plate or sheet firmly and the film crystallizes well, and it is able to say that the anatase crystal shape or the anatase and rutile mixed crystal shape has fine crystal particles, about 10 nanometer, large specific area and long service life.

Description

technical field [0001] The invention relates to a method for preparing a crystalline nano-titanium dioxide film on the surface of metal titanium and the prepared titanium plate (sheet) whose surface is covered with a crystalline nano-titanium dioxide film. Background technique [0002] Titanium dioxide thin films are widely used in high-tech fields such as photocatalysis, sensors, solar cells, and biomaterials. Most of these applications require titanium dioxide films to have the following structures and properties: well-crystallized anatase or rutile crystal form, fine grain size, high specific surface area, high purity, and good bonding between the film and the substrate. [0003] At present, methods for preparing crystalline titanium dioxide thin films include magnetron sputtering, electrochemical deposition, chemical vapor deposition, liquid deposition, thermal decomposition, and sol-gel methods. Most of the above-mentioned methods involve complicated equipment or compl...

Claims

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Application Information

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IPC IPC(8): B01J21/06B01J35/02B01J37/12C23C8/40C23C22/68
Inventor 吴进明甘澍霆甘宪
Owner 甘宪
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