Light interference type display unit structure and producing method
A technology of display unit and manufacturing method, applied in optical components, semiconductor/solid-state device manufacturing, optics, etc., can solve the problems of high cost and inability to improve pass rate, achieve high resolution, improve process pass rate, and process pass rate high effect
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[0039] Figure 6A 6F is a manufacturing method of an array color flat panel display structure according to a preferred embodiment of the present invention. Please refer to Figure 6A Firstly, a first electrode 602 and a sacrificial layer 604 are sequentially formed on a transparent substrate 601, wherein the sacrificial layer 604 can be made of a transparent material, such as a dielectric material, or an opaque material, such as a metal material. Openings 606, 608, 610, 612 are formed in the first electrode 602 and the sacrificial layer 604 by a lithographic etching process, and the openings 606, 608, 610, 612 are suitable for forming supports therein.
[0040] Next, a material layer 614 is formed on the sacrificial layer 604 and fills the openings 606 , 608 , 610 , 612 . Two of the four openings 606 , 608 , 610 , 612 define the positions of the light-emitting interferometric display units 630 , 632 , and 634 . The material layer 614 is suitable for forming a support, gener...
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