Method and apparatus for manufacturing thin film transistor array
A technology of thin film transistors and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of difficult maintenance, unguaranteed, high cost, etc., to strengthen the bearing capacity, eliminate static damage, and improve production The effect of yield
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[0021] figure 1 It is a manufacturing flow chart of a thin film transistor (thin film transistor, referred to as TFT) array (array) according to a preferred embodiment of the present invention, wherein each conductor layer is manufactured by a two-stage photomask process, and each The staged photomask process includes, for example, photoresist coating, soft baking, hard baking, exposure, fixing, development, etching and other steps to pattern the conductor layer.
[0022] Please refer to figure 1 , in step 100, a substrate is provided, and the substrate is a transparent substrate, such as a glass substrate or a quartz substrate. Next, in step 102, an nth conductor layer is formed on the substrate, where n=1, 2, ..., n, the conductor layer in this embodiment is not limited to the number of conductor layers, as long as it can The conductive layer where electrostatic damage occurs can be fabricated according to the method of this embodiment.
[0023] Subsequently, in step 104 ...
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