Unlock instant, AI-driven research and patent intelligence for your innovation.

Apparatus and method for depositing large area coating on explanate surface

A flat surface and equipment technology, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve problems such as uneconomical, decreased coating uniformity, and increased cost

Inactive Publication Date: 2015-04-08
SABIC GLOBAL TECH BV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when scaling plasma deposition techniques to coat larger sized surfaces, the use of separate reactant sources and flow controllers leads to significant uncertainty in the coating process and leads to a decrease in coating uniformity
In addition, as the number of plasma sources used in the coating process increases, the cost of equipping each plasma source with an independent delivery system and flow control increases significantly
[0005] Arrays of multiple plasma sources where each plasma source has an independent reactive gas injection system cannot uniformly coat large flat surfaces and is not economical

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus and method for depositing large area coating on explanate surface
  • Apparatus and method for depositing large area coating on explanate surface
  • Apparatus and method for depositing large area coating on explanate surface

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0043] By comparing coatings deposited on flat (i.e. planar) polycarbonate substrates using an array of ETP sources provided with a common reactant gas injection ring of the present invention with coatings deposited using an array of ETP sources provided with individual reactant gas injectors , providing experimental support for the present invention. Thickness distribution and use of amorphous hydrogenated silicon carbide (hereinafter referred to as "a-SiC:H") coatings obtained with an ETP source array in which a vinyltrimethylsilane (VTMS) precursor is delivered to nozzles of multiple independent ETP sources Comparison of the thickness distribution of a-SiC:H coating obtained by VTMS for the ETP source array provided with the common reactant gas injection ring of the present invention. Figure 4 The thickness distribution of the coating is shown in . Ratio of the standard deviation of the thickness at locations between the ETP sources to the average thickness (Σ / average) (3...

example 2

[0045] The thickness distribution of the a-SiC:H coating was obtained with an array of ETP sources, in which octamethylcyclotetrasiloxane (D4) reactive gas was supplied to the plasma generated by the array of ETP sources through the common reactive gas injection ring of the present invention. Figure 5 The thickness distribution of the deposited coatings is shown. The results show that deposition with D4 results in a coating with 5% (Σ / average) of the thickness between ETP sources. Thus, the coating obtained by supplying the reactive gas D4 to the ETP-generated plasma through the common injection gas ring of the present invention exhibits higher uniformity.

example 3

[0047] By D4 and oxygen (O 2 ) mixture on the polycarbonate substrate to deposit amorphous hydrogenated silicon oxycarbide (hereinafter referred to as "a-SiO x C y :H") coating. In one experiment, the coating was injected with D4 and O through a single common reactant gas injection ring. 2 to deposit. In another experiment, the coating was injected with O through a separate common reactive gas injection ring. 2 and D4 to deposit. The coating thickness of the deposited coating is distributed in Image 6 in comparison. Image 6 There is no statistical difference in the thickness distribution in , which shows that separate multiple reactive gases can be provided to the plasma generated by multiple ETP plasma sources through a single common reactive gas injector or separated multiple common gas injectors, thereby A highly uniform coating is obtained.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

A method and apparatus (200) for depositing a uniform coating (232) on a large area, planar surface (234) using an array (210) of multiple plasma sources (212) and a common reactant gas injector (220). The apparatus (200) includes at least one array of a plurality of plasma sources (212), wherein each of the plurality of plasma sources (212) includes a cathode (214), an anode (216), and an inlet (218) for a non-reactive plasma source gas disposed in a plasma chamber (202), and a common reactant gas injector (220) disposed in a deposition chamber (204) that contains the substrate (230). The common reactant gas injector (220) provides a uniform flow of at least one reactant gas to each of the multiple plasmas generated the multiple plasma sources (212) through a single delivery system. The at least one reactant gas reacts with the plurality of plasmas to form a uniform coating (232) on a substrate (230).

Description

technical field [0001] The present invention relates to an apparatus and method for depositing a uniform coating on a flat surface. More specifically, the present invention relates to a method and apparatus for depositing uniform coatings on planar surfaces using multiple plasma sources. Still more particularly, the present invention relates to a method and apparatus for depositing uniform coatings on planar surfaces by injecting reactive gases through a common injection system into a plurality of plasmas generated by multiple expansion thermal plasma sources. Background technique [0002] The plasma source is capable of depositing various coatings on substrates at high deposition rates, such as clear abrasion resistant coatings, clear UV filter coatings, and multi-layer coating housings. During such deposition, the reactive gases react with the plasma to form species that are deposited on the substrate. A single plasma source, such as an expanding thermal plasma (hereinaf...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/513H01J37/32C23C16/455C23C16/44C23C16/50
CPCH01J37/32009C23C16/4558C23C16/513C23C16/50H01L21/67207H01L21/0262
Inventor 马克·谢普肯斯
Owner SABIC GLOBAL TECH BV