Nano marking press

An embossing machine and nanotechnology, applied in printing machines, rotary printing machines, printing, etc., can solve the problems of no overlay alignment system, limited processing of single-layer nano-patterns, etc., and achieve automatic leveling and good flexibility Effect
CN1775546AInactive Publication Date: 2006-05-24HUAZHONG UNIV OF SCI & TECH
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
HUAZHONG UNIV OF SCI & TECH
Publication Date
2006-05-24
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides an nano imprinter, comprising an X-Y rough action work table, a leveling device, an X-Y micro action work table, a sheet bearing plate, and a rotating work table, where the X-Y rough action work table is driven by two step motors to realize the horizontal rough location of the sample on the template and sheet bearing plate, the pressure sensor in the leveling device is used to measure and control the pressure in the course of imprinting and separating so as to control a DC servo motor to drive the template to move up and down, the X-Y micro action work table is driven by two piezoelectric ceramic tubes to regulate the horizontal fine location between the template and the sample, and the rotating work table is driven two step motors to realize the fine and rough location of the corner between the template and the sample. The invention has locating and aligning precision better than 20nm and can work in two modes of cold and hot imprinting, and has better flexibility.
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Description

technical field

[0001] The invention relates to a manufacturing device for nanoscale structures and devices, in particular to a manufacturing device for multilayer nanoscale structures and devices. Background technique

[0002] Optical lithography technology is difficult to produce patterns with line widths less than 100nm due to the limitation of light wavelength and numerical aperture, as well as the influence of scattering and interference. Although a series of difficult improvements, such as extreme ultraviolet lithography, X-ray lithography, electron beam projection, ion beam projection, micro-electron beam array, etc., can also overcome the diffraction limit caused by linewidths less than 100nm, the system Complicated and very expensive. In order to further promote the development of the semiconductor industry and nanotechnology, it is imperative to study a nanofabrication equipment that makes the process simple, low in cost and high in production efficiency. [0003...

Claims

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