Photosensitive composition and process for production of printed wiring boards with the same
A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, and can solve the problems of prolonged exposure time, large quantities, poor productivity, etc.
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Embodiment 1
[0068] Preparation of photosensitive resist solution K
[0069] Photosensitive resist stock solution E was mixed with 35.0 parts of MEK (methyl ethyl ketone) and 15.9 parts of propylene glycol monomethyl ether acetate, and stirred to prepare photosensitive resist solution K.
Embodiment 2
[0071] Preparation of photosensitive resist liquid L
[0072] Use photosensitive resist stock solution E directly.
Embodiment 3
[0074] Preparation of photosensitive resist liquid M
[0075] Photosensitive resist liquid M was prepared by mixing 35.0 parts of MEK and 15.9 parts of propylene glycol monomethyl ether acetate into photosensitive resist stock solution F and stirring.
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