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Photosensitive composition and process for production of printed wiring boards with the same

A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, and can solve the problems of prolonged exposure time, large quantities, poor productivity, etc.

Inactive Publication Date: 2006-06-28
MITSUI CHEM INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the etching resist layer formed from the conventionally used photosensitive resist liquid has three or more ethylenically unsaturated groups and has a viscosity of 25° C. at 1 atmosphere. In the case of a photosensitive compound of 2000mPa·s or more, although the etching resist layers will not stick to each other, the exposure sensitivity is low, and a large amount of light must be used
If a large amount of light is required, the exposure time will be long, and the productivity will be poor, making practical use difficult.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0068] Preparation of photosensitive resist solution K

[0069] Photosensitive resist stock solution E was mixed with 35.0 parts of MEK (methyl ethyl ketone) and 15.9 parts of propylene glycol monomethyl ether acetate, and stirred to prepare photosensitive resist solution K.

Embodiment 2

[0071] Preparation of photosensitive resist liquid L

[0072] Use photosensitive resist stock solution E directly.

Embodiment 3

[0074] Preparation of photosensitive resist liquid M

[0075] Photosensitive resist liquid M was prepared by mixing 35.0 parts of MEK and 15.9 parts of propylene glycol monomethyl ether acetate into photosensitive resist stock solution F and stirring.

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PUM

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Abstract

The invention relates to a photosensitive resin composition characterized by containing at least one resin which has photopolymerizable ethylenically unsaturated groups on the side chains and a photosensitive compound which has three or more ethylenically unsaturated groups and exhibits a viscosity of 2000mPa s or above at 25 DEG C under one atm; and a process for the production of wiring boards with the same.

Description

technical field [0001] The present invention relates to a photosensitive resin composition and a method for producing a printed circuit board using the same. Background technique [0002] In order to easily and reliably manufacture printed circuit boards with fine and high-density conductor patterns, a photosensitive resist solution that essentially has excellent resolution and other properties is directly coated on the metal conductor layer on the surface of the insulating substrate to form A dip method is widely known in which a resist layer is etched and the etching resist layer is formed in accordance with a predetermined resist pattern. This method is simple and does not generate pinholes in the formed etching resist layer, so it is an effective method when a relatively thick film of several micrometers to twenty micrometers is required. [0003] However, the etching resist layer formed from the conventionally used photosensitive resist solution has three or more ethyl...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/038H05K3/06G03F7/033
CPCG03F7/033G03F7/027G03F7/038
Inventor 森本秀信牧野繁男安田清美田原修二
Owner MITSUI CHEM INC
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