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Photosensitive resin composites, spacer for display panel and display panel

A technology of photosensitive resin and display panel, which is applied in the field of photosensitive resin composition, and can solve the problems of foreign matter, device pollution, harshness, etc.

Inactive Publication Date: 2006-07-05
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in existing materials, at 1500J / m 2 or less, it is difficult to obtain a sufficiently good spacer shape and film thickness
[0010] In addition, the requirements related to the controllability of the spacer shape and film thickness have become more and more stringent in recent years. Regarding the change of the shape and film thickness caused by the process change when forming the spacer, and the change of the composition solution over time The issue of shape and film thickness stability remains to be studied
Especially at 1500J / m 2 In the area of ​​exposure amount of 1000000000000000000000000000000000000000 by 100000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000 things related to the controllability of spacershape and film thickness with respect to exposure amount to be studied
[0011] In addition, in recent years, during the storage and use of the photosensitive resin composition used in the manufacture of liquid crystal display panels, foreign matter is generated due to the crystallization of components in the composition, etc., thereby contaminating the device. Problems with Photosensitive Resin Compositions

Method used

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  • Photosensitive resin composites, spacer for display panel and display panel
  • Photosensitive resin composites, spacer for display panel and display panel
  • Photosensitive resin composites, spacer for display panel and display panel

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0172] As a solvent used for preparation of the said composition solution, what dissolves each component which comprises a photosensitive resin composition (1) uniformly, and does not react with each component is used.

[0173] Examples of such a solvent include the same solvents as those exemplified as solvents that can be used for producing the above-mentioned copolymer [A].

[0174] Among such solvents, alcohols, glycol ethers, glycol alkyl ether acetates, esters, etc. and diethylene glycol. Among them, for example, benzyl alcohol, 2-phenylethyl alcohol, 3-phenyl-1-propanol, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol Diethyl ether, diethylene glycol ethyl methyl ether, diglyme, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl methoxypropionate, ethyl ethoxypropionate.

[0175] In addition, in order to improve the in-plane uniformity of the film thickness, a high-boiling-point so...

Embodiment

[0191] Hereinafter, although an Example and a comparative example are illustrated and this invention is demonstrated more concretely, this invention is not limited to these Examples.

Synthetic example 1

[0193] In the flask equipped with condenser tube and stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 200 parts by weight of diethylene glycol methyl ethyl ether are charged, and then Enter 18 parts by weight of methacrylic acid, 40 parts by weight of glycidyl methacrylate, 5 parts by weight of styrene and 32 parts by weight of tricyclic methacrylate [5.2.1.0 2，6 ]dec-8-yl ester, after replacing with nitrogen, then charge 5 parts by weight of 1,3-butadiene, stir slowly, and at the same time make the temperature of the solution rise to 70°C, keep the temperature for 5 hours for polymerization, and obtain A solution of copolymer [A-1].

[0194] The solid content concentration of this solution was 33.0% by weight, and the Mw of the copolymer [A-1] was 11,000.

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PUM

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Abstract

To provide a photosensitive resin composition capable of faithfully reproducing the design size of a mask pattern with high sensitivity, superior in adhesion to a substrate, capable of giving satisfactory spacer shape and film thickness with an exposure energy of <=1,500 J / m2, superior also in strength and heat resistance, excellent in controllability of spacer shape and film thickness in a low exposure energy region, less liable to generate foreign substances during the storage period and during use, and capable of forming spacers for a display panel that is superior in process stability and temporal stability, and to provide spacers for a display panel and a display panel. The photosensitive resin composition contains [A] a copolymer of (a1) an ethylenically unsaturated carboxylic acid and / or an ethylenically unsaturated carboxylic acid anhydride and (a2) another ethylenically unsaturated compound, [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] an o-acyloxime type photopolymerization initiator.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a spacer for a display panel, and a display panel. More specifically, it relates to a photosensitive resin composition suitable as a material for forming a spacer used in a display panel such as a liquid crystal display panel or a touch panel, a spacer for a display panel formed from the composition, and a display having the spacer panel. Background technique [0002] In liquid crystal display panels, spacer particles such as glass beads or plastic beads having a predetermined particle diameter have been used conventionally in order to maintain a constant distance (cell gap) between two substrates. Since these spacer particles are randomly scattered on transparent substrates such as glass substrates, once the spacer particles are present in the pixel formation area, the spacer particles will cause imaging phenomena, or the incident light will scatter, and the contrast of the liquid c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/033G03F7/004G02F1/133
Inventor 一户大吾西尾寿浩浜口仁岩渕智子米仓勇梶田彻
Owner JSR CORPORATIOON