Method for manufacturing diamond-like film and part with coating manufactured thereby

A manufacturing method and diamond technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of complex rotation and difficulty of the substrate

Inactive Publication Date: 2006-09-06
NORTHEASTERN UNIV
View PDF4 Cites 44 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Secondly, for large parts and parts with complex structures, how to ensure the uniformity and isotropy of the film is also a big problem
In the existing film deposition technology, the arrangement of the carbon film and the substrate (ie components) has a certain directionality, and the carbon ion generating device forming the DLC film, such as an ion gun, a magnetron sputtering target, and a cathode arc source Etc., to realize the all-round deposition of large area such as the aforementioned application 01121264.0 and Chinese patent ZL97103251.3, on the one hand require that the carbon ion generating device must be large enough; More complicated rotation, which is quite difficult in the limited space of the vacuum chamber

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing diamond-like film and part with coating manufactured thereby
  • Method for manufacturing diamond-like film and part with coating manufactured thereby
  • Method for manufacturing diamond-like film and part with coating manufactured thereby

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] Embodiment 1: Deposit Ti / TiN / TiC / DLC composite carbon film on stainless steel sheet

[0038] figure 1 One of the DLC film-clad components 1 has a substrate 11, a metal film 12, a nitride film 13, a carbide film 14 and a carbon film 15 superimposed on at least a part of the substrate 11, which are sequentially deposited on the substrate.

[0039] The base 11 is made of stainless steel (such as 1Cr18Ni9Ti). The metal layer contains one or several elements that make up the base. In this example, the metal layer, nitride layer, and carbide layer are Ti, TiN, and TiC, respectively. The carbon film 15 is a DLC film. In this example, the metal film 12, the nitride film 13 and the carbide film 14 were formed using a rotary magnetron arc ion plating deposition device (see Table 1 for general growth conditions of samples).

[0040] Work step

Current (A)

Pressure (Pa)

Substrate temperature (℃)

the gas

time (min)

Ti

150

5.0*10 -1 ...

Embodiment 2

[0061] Example 2 Deposition of Ti / TiN / TiC / DLC composite carbon film on stainless steel sheet with magnetron sputtering combined with RFPECVD equipment

[0062] On the basis of the RFPECVD equipment of the present invention in preceding example 1, magnetron sputtering is combined with PECVD equipment, thereby realized the deposition diamond-like carbon film and intermediate transition layer (as metal, nitride, carbide) on a piece of equipment etc.) to improve the deposition efficiency.

[0063] Figure 6The shown RFPECVD apparatus includes a cylindrical plasma generation chamber 37 (upper part) and a similarly cylindrical plasma processing chamber 38 (lower part), and these form a vacuum chamber (film formation chamber). The two chambers are on the same axis, and the two chambers are connected up and down. The plasma generation chamber 37 is provided with an antenna-shaped RF coil 31 along its outer wall, and the coil connector 28 is connected to a matching box and a 13.56 MH...

Embodiment 3

[0071] Embodiment 3 deposits Cr / CrN / CrC / DLC composite carbon film on razor blade

[0072] On the basis of the RFPECVD equipment in Example 2, microwave ECR, inductive coupling and plasma generation equipment are combined to improve deposition efficiency.

[0073] Figure 8 The RFPECVD device shown is driven by an RF power source, using microwaves to excite the reactive gas into a plasma state, and at the same time, under the contraction of the magnetic field to confine the space plasma, an electron cyclotron wave resonance plasma is formed to achieve the purpose of accelerating film formation .

[0074] In this device, metal films, metal nitride films, and metal carbides can be deposited on the surface of different substrates by using the effective sputtering of high-energy ions on the target under the confinement of the magnetic field and the chemical reaction in the high ionization rate plasma environment. Films and diamond-like carbon films can deposit composite film syst...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides the radio-frequency excited plasma enhancement chemical vapour deposition method, comprising the following steps: depositing a layer of sheet metal on the background, then depositing nitride or carbonide on sheet metal, and depositing adamantine carbon film on the nitride or carbonide. The invention also provides the part with composite coating which is made by the method, and the base material of the part is metal or ceramic or glass or organic resin. The invention provides the radio-frequency excited plasma enhancement chemical vapour deposition method device, which comprises more than one metal sputtering source, and evacuated chamber which comprises plasma generating chamber and plasma treatment chamber. In the plasma treatment chamber there is plasma treatment chamber to make the coating homogeneous and isotropism. Adjust electric voltage, current and Ar, N2 and carbonaceous gas content to deposit high adhesive force adamantine carbon film.

Description

technical field [0001] The invention belongs to the technical field of material surface processing, and in particular relates to a method for depositing a diamond-like carbon film on a base material, a device for implementing the method and a component with a coating film manufactured by the method. Background technique [0002] Plating diamond-like carbon films (Diamond-like Carbon films, hereinafter referred to as DLC films) on steel and other metal parts as wear-resistant and anti-friction coatings and self-lubricating materials has practical and potential economic value, and it can be applied to such as drill bits , gears, bearings, molds, punches and medical equipment and other fields, but currently there are many factors that limit the promotion and application of DLC film technology. [0003] First of all, due to the difference in performance between the substrate and the film and the existence of interfacial compressive stress, the adhesion between the DLC film and m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C16/505C23C16/513
Inventor 蔺增巴德纯
Owner NORTHEASTERN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap