Organic EL element, method for fabricating the same and organic el display device
An organic and component technology, applied in the field of organic EL layer composition, can solve the problem of reduced luminous life, and achieve the effects of low driving voltage, high display quality, and low interlayer short circuit tolerance
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Embodiment 1
[0093] Example 1 will be explained with reference to Table 1. An organic EL element was manufactured, which has a laminated structure including an anode, a first organic thin film (hole injection layer), a second organic thin film (hole transfer layer), a third organic thin film (light emitting layer), a fourth organic thin film Thin film (electron injection layer) and cathode. The anode consists of a 150 nm ITO film. Using a solution of PTPDEK (5 mg / mL) and p-toluenesulfonic acid (20% by weight) as a dopant in cyclohexanone, a first organic thin film (hole injection layer) was provided by spraying. The second organic thin film (hole transport layer) was composed of 2-TNATA with a thickness of 50 nm. The third organic thin film (light emission layer) is made of the Alq of 60nm thickness 3 Composition, the fourth organic thin film (electron injection layer) is composed of Lif with a film thickness of 0.5 nm. The cathode consisted of an aluminum film of 80nm.
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Embodiment 2
[0100] In this example, an organic EL element having a laminated structure including an anode, a first organic thin film (hole injection layer), a second organic thin film (hole transport layer), a third organic thin film (light emitting layer) was fabricated. layer), the fourth organic thin film (electron injection layer) and the cathode. The anode is composed of a 150 nm ITO film. When setting the first organic thin film (hole injection layer), first 150% by weight of sulfosalicylic acid is added as a dopant to the oligoaniline unit represented by chemical formula A and tetracarboxylic dianhydride, and the mixture is dissolved in cyclohexane In a ketone solution, the mixed solution was applied as an applied film by a sputtering method. Then, the applied film was baked at 250° C. for 1 hour to obtain an organic thin film-forming molecule represented by Chemical Formula B.
[0101] Chemical formula A:
[0102]
[0103] Chemical formula B:
[0104]
[0105] The second...
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