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Method for stabilizing Nano silica sol dedicated for super large scale integration

A large-scale integrated circuit, nano-silica sol technology, applied in chemical instruments and methods, silicon compounds, polishing compositions containing abrasives, etc., can solve problems such as poor stability of high-concentration acidic silica sol, and achieve long service life, High working reliability and the effect of enhancing stability

Inactive Publication Date: 2006-12-06
HEBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problem of poor stability of known high-concentration acidic silica sol, and discloses a preparation method of high-concentration acidic silica sol with simple production process and high stability

Method used

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  • Method for stabilizing Nano silica sol dedicated for super large scale integration
  • Method for stabilizing Nano silica sol dedicated for super large scale integration
  • Method for stabilizing Nano silica sol dedicated for super large scale integration

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Inject 1752ml, 3% hydrochloric acid solution into an ion exchange column equipped with 800ml Nankai brand 001×7 type cation exchange resin and stir. After stirring for 3 minutes, let it stand for stratification, remove the upper layer solution, and rinse the remaining cations with deionized water. Exchange the resin until its pH value is between 2-2.5 to obtain an acidic cation exchange resin.

[0041] Then the concentration is 30%, the particle diameter is 22nm, the alkaline silica sol 536g that metal ion content is higher than 100ppm joins in the above-mentioned acidic cation exchange resin of 400ml under the situation of continuous stirring, exchange 15min under the situation of stirring, measure simultaneously Exchange the Zeta potential of the solution so that its absolute value is above 30mv, then stop stirring, leave to stand for stratification, and discharge to obtain acidic silica sol.

[0042] Then get 834ml, 3% sodium hydroxide solution and inject in the ion ...

Embodiment 2

[0047] Inject 2102.2ml, 5% hydrochloric acid solution into an ion exchange column equipped with 1600ml American Amberjet 1200Na cation exchange resin for stirring. After stirring for 5 minutes, let it stand for stratification, remove the upper layer solution, and rinse the remaining cation exchange resin with deionized water. Resin until its pH value is between 2.5-3 to obtain acidic cation exchange resin.

[0048] Then the concentration is 37%, the particle diameter is 47nm, the alkaline silica sol 536g that metal ion content is higher than 100ppm joins in the above-mentioned acidic cation exchange resin of 800ml under the situation of continuous stirring, exchange 30min under the situation of stirring, measure simultaneously Exchange the Zeta potential of the solution so that its absolute value is above 40mv, then stop stirring, leave to stand for stratification, and discharge to obtain acidic silica sol.

[0049] Then get 1000ml, 5% sodium hydroxide solution and inject in t...

Embodiment 3

[0054] Inject 1325ml, 10% hydrochloric acid solution into an ion exchange column equipped with 2000ml German Lewatit-100 cation exchange resin for stirring. After stirring for 10 minutes, let it stand for stratification, remove the upper layer solution, and rinse the remaining cation exchange resin with deionized water. Resin until its pH value is between 3-3.5 to obtain acidic cation exchange resin.

[0055] Then the concentration is 42%, the particle diameter is 60nm, the alkaline silica sol 536g that metal ion content is higher than 100ppm joins in the above-mentioned acidic cation exchange resin of 1000ml under the situation of continuous stirring, exchange 60min under the situation of stirring, measure simultaneously Exchange the Zeta potential of the solution so that its absolute value is above 60mv, then stop stirring, leave to stand for stratification, and discharge to obtain acidic silica sol.

[0056] Then get 625ml, 10% sodium hydroxide solution and inject in the io...

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Abstract

This invention discloses a method for preparing stable acidic silica nanosol with a high concentration used for large-scale integrated circuit. The method comprises: performing cation-anion-cation exchange to purify the silica nanosol; (2) adding polyether nonionic surfactant to the silica nanosol at a vol. ratio of (1-10): 1000; (3) adding an acid to the silica nanosol to adjust the pH value. The method can purify the silica nanosol as well as ensure the stability of the silica nanosol. The method has such advantages as simple process, high efficiency, low equipment cost, short preparation time, and low energy consumption.

Description

technical field [0001] The invention belongs to nano abrasives, in particular to a method for improving the stability of high-concentration silica sol used for CMP special grinding and polishing in the field of microelectronic processing. Background technique [0002] At present, acidic silica sol is widely used in fine polishing of gallium arsenide and catalyst carrier in the chemical industry, and its application field is gradually expanding. Therefore, the research on acidic silica sol has also attracted people's attention. Since the acidic silica sol is in a metastable state, it will gradually gel during the placement process, especially the high-concentration acidic silica sol has a more obvious gel tendency. Improper control makes the silica sol easy to produce gel, and the stability of the acidic silica sol abrasive is closely related to the stability of the polishing fluid. If the stability of the abrasive is poor, the stability of the polishing fluid will also decr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/158C09G1/02
Inventor 刘玉岭王娟张西慧张建新刘承霖
Owner HEBEI UNIV OF TECH
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