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Coating compositions

A technology of composition and water-based composition, which can be applied in the direction of coating, photoplate-making process coating equipment, photosensitive materials for optomechanical equipment, etc., and can solve environmental problems and other problems

Inactive Publication Date: 2010-10-13
ROHM & HAAS ELECTRONICS MATERIALS LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, various fluorinated components have created environmental concerns

Method used

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  • Coating compositions
  • Coating compositions
  • Coating compositions

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0156] Example 1: Preparation and application of the composition

[0157] The coating compositions of the present invention were prepared by mixing the following components in the following amounts (based on total composition weight).

[0158] 1. 0.250% by weight poly(vinyl alcohol)

[0159] 2.2.250% by weight colloidal silica (diameter<20nm)

[0160] 3.97.500% by weight water

[0161] The composition was spin-coated onto a dry photoresist layer that had been applied to a silicon wafer substrate.

Embodiment 2

[0162] Example 2: Preparation and application of the composition

[0163] Another coating composition of the present invention was prepared by mixing the following components in the following amounts (based on total composition weight).

[0164] 1.0.500% by weight poly(vinyl alcohol)

[0165] 2.2.000% by weight colloidal silica (diameter < 20nm)

[0166] 3.97.500% by weight water

[0167] The composition was spin-coated onto a dry photoresist layer that had been applied to a silicon wafer substrate. The quality of the coating was good, with less than 1% variation in coating thickness across the applied coating.

Embodiment 3

[0168] Example 3: Preparation and printing process of the composition

[0169] Another coating composition of the present invention was prepared by mixing the following components in the following amounts (based on total composition weight).

[0170] 1. 0.469% by weight poly(acrylic acid)

[0171] 2.2.211% by weight colloidal silica (diameter<20nm)

[0172] 3.97.320% by weight water

[0173] The pH of the solution was 6.5. The composition was spin-coated onto a dry photoresist layer that had been applied to a silicon wafer substrate. The sample has good coating quality. The film has a refractive index of 1.315 at a wavelength of 673 nm.

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Abstract

In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.

Description

[0001] This application claims priority to US Provisional Application No. 60 / 678,032, filed March 4, 2005, and US Provisional Application No. 60 / 682,941, filed May 19, 2005. Background technique [0002] In one aspect, the invention relates to a coating composition comprising a component having one or more of silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium and / or Zinc compounds. In another aspect, the invention includes coating compositions that contain a plurality of particles. Preferred coating compositions of the invention are used in antireflective applications, especially in combination with photoresist coatings. The coating compositions of the present invention are also useful as photoresist protective layers in immersion lithography processes. In particular, a top (overcoated) antireflective composition is provided. [0003] Photoresists are light-sensitive films used to transfer images to substrates. A photoresist ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F7/16G03F7/09
CPCG03F7/2041G03F7/091G03F7/11C09D1/00C08K3/36C09D129/04C09D133/02
Inventor G·P·普罗科波维奇M·K·格拉戈尔
Owner ROHM & HAAS ELECTRONICS MATERIALS LLC