Nano pitch templet and preparation method thereof

Abstract

The invention relates to a nanometer pitch copy and relative preparing method. First, the plasma enhancing chemical vapor deposition (CVD) craft and the radio-frequency magnetron sputtering craft alternating deposit multiple Si3N4 film and Cr film on the silicon chip; second, scribing the silicon chip and jointing their surfaces that deposited with multi-ply film face-to-face; third, clamping the silicon chips by right and left grip blocks, to make the sections of silicon chips with multiple films as the surface of nanometer pitch copy; then, injecting epoxies resin into the groove formed by right and left grip blocks and solidifying it; at last, using metallographic paper and alumina suspension to sand, buffer, and clean said sections in turn to form a nanometer pitch copy surface to obtain the nanometer pitch copy with required nominal value.

Description

technical field [0001] The invention belongs to the micro-nano testing technology, in particular to a nano-pitch template used for the measurement of the nano-pitch and the non-real-time calibration of the pitch in a nano-metering system and a preparation method thereof. Background technique [0002] The nano-pitch template and the preparation method thereof belong to the field of micro-nano testing technology, and are widely used in the fields of semiconductor, flat panel display, high-density memory, precision instrument and precision machinery, ultra-precision processing and the like. The nano-pitch template can be used for the measurement and control of micro-nano line width and pitch, as well as the calibration and traceability of related nanometer measuring instruments. In the measurement of nanopitch and line width, the nanopitch template can provide a nanopitch benchmark, through which the pitch data obtained by different methods, different instruments at different p...

AI Technical Summary

Problems solved by technology

The level of nano-pitch templates prepared by microfabrication technology depends on the development of plate making technology, pattern transfer technology, etching technology, etc. These technologies have strict environmental requirements, harsh processing conditions and high costs

In recent years, the lithography technology based on the scanning probe microscope has been developed and can also be used for the preparation of nano-pitch templates, but the process speed is low and the repeatability is poor.

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