Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-cleaning household appliance glass capable of shielding electromagnetic radiation and its prepn

A self-cleaning, electromagnetic wave technology, applied in the field of home-coated glass and its preparation, to achieve the effects of light weight, elimination of condensation, and strong chemical bonding

Inactive Publication Date: 2007-01-03
杭州百高实业有限公司
View PDF0 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, combining TCO functional films with TiO 2 Functional film compounding, the preparation of coated glass products with both electromagnetic wave, infrared heat radiation shielding and photocatalytic self-cleaning effects, has not been reported in the literature so far

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning household appliance glass capable of shielding electromagnetic radiation and its prepn

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] 1) Using ordinary white glass as the substrate material, the substrate is cleaned by conventional chemicals, filtered and washed with deionized water, placed on the roller conveying device, dried and sent to a fully enclosed tunnel multi-step coating studio (Background vacuum degree 3×10 -3 Pa) start to deposit thin films sequentially. In the first studio, RF-PECVD is used to deposit silicon oxide on the substrate. First, the substrate is plasma-bombarded in a nitrogen atmosphere for 10 minutes, and then the substrate is heated to 250 ° C. The reaction pressure is 40 Pa, and the reaction source gas is diluted with nitrogen. After the concentration of 5-15% silane SiH 4 and diluted with nitrogen to a concentration of 5-15% nitrous oxide N 2 O, SiH 4 :N 2 The flow ratio of O is 1:1.1.

[0025] 2) Transfer the glass on which the silicon oxide film has been deposited to the second working room with a background vacuum of 3×10 -3 Pa, Sb-doped SnO deposited by MO-PECVD ...

Embodiment 2

[0029]1) Using ordinary white glass as the substrate material, the substrate is cleaned by conventional chemicals, filtered and washed with deionized water, placed on the roller conveying device, dried and sent to a fully enclosed tunnel multi-step coating studio (Background vacuum degree 3×10 -3 Pa) start to deposit thin films sequentially. In the first studio, RF-PECVD is used to deposit silicon oxide on the substrate. First, the substrate is plasma-bombarded in a nitrogen atmosphere for 10 minutes, and then the substrate is heated to 250 ° C. The reaction pressure is 40 Pa, and the reaction source gas is diluted with nitrogen. After the concentration of 5-15% silane SiH 4 and diluted with nitrogen to a concentration of 5-15% nitrous oxide N 2 O, SiH 4 :N 2 The flow ratio of O is 1:1.2.

[0030] 2) Transfer the glass coated with silicon oxide film to the second working room, the background vacuum degree is 3×10 -3 Pa, Sb-doped SnO deposited by MO-PECVD 2 Thin film, ea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The self-cleaning household appliance glass capable of shielding electromagnetic radiation is constituted through depositing silica film layer, Sb-doped SnO2 film layer and N-doped TiO2 film layer successively on glass substrate. It is made in a completely closed tunnel equipment and through multiple step coating process including the first RF plasma reinforced chemical vapor deposition of silica film layer, the subsequent metal organic chemical vapor deposition of Sb-doped SnO2 film layer, and final DC reaction and magnetically controlled sputtering deposition of N-doped TiO2 film layer. The self-cleaning household appliance glass has the advantages of both TCO coating glass and self-cleaning coated glass, and can shield electromagnetic wave and infrared radiation and self cleaning.

Description

technical field [0001] The invention relates to a home appliance coated glass and a preparation method thereof, in particular to a home appliance coated glass with functions of electromagnetic wave, infrared radiation shielding and self-cleaning and a preparation method thereof. Background technique [0002] A large number of household appliances such as microwave ovens, disinfection cabinets, freezers, electric ovens, and refrigerators are widely used in modern kitchens. The common features of these appliances are: 1) The observation windows or doors of the appliances are made of transparent glass, so that people can observe the conditions inside the appliances . 2) Electrical appliances will radiate electromagnetic waves such as microwaves and infrared rays during operation, or need to shield infrared heat radiation from the outside world. [0003] In the application of microwave ovens, microwave radiation will have certain negative effects on the human body. Medical res...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C17/34C03C17/23C03C17/245C03C4/00
Inventor 平柏战张溪文
Owner 杭州百高实业有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products