Multiple mask exposure system and method

Abstract

An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask. The exposure system also includes a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.

Description

technical field [0001] The invention relates to an exposure system, in particular to an exposure system capable of stacking multiple photomasks and an exposure method thereof. Background technique [0002] In semiconductor integrated circuit (IC) technology, the development of minimizing feature size and maximizing packing density is very rapid. Feature size minimization is the creation of smaller feature structures through the improvement and enhancement of lithography technology. For example, an alternating phase shifting mask can project smaller features with a preset imaging tool. The alternating phase shift mask often requires the addition of a second correction mask, however, double exposure and mask replacement often results in higher manufacturing costs, lower productivity and more alignment problems. [0003] It can be seen that the above-mentioned existing lithography system obviously still has inconveniences and defects in product structure, manufacturing method...

AI Technical Summary

Problems solved by technology

[0005] The main purpose of the present invention is to overcome the defects existing in the existing exposure system, and provide a multi-mask exposure system with a new structure, which is used to improve the traditional multi-mask needs to go through multiple exposure processes, and the production efficiency cannot be improved. making it more practical

[0006] Another object of the present invention is to overcome the defects of the existing exposure system and provide a multi-mask exposure system to improve the traditional multi-mask exposure process and need to replace several masks. The problem of poor accuracy, so it is more suitable for practical

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