High-temperature-resistant optical film doped with stabilized zirconia and method for preparing same

A technology for stabilizing zirconia and optical films, applied in optics, optical components, ion implantation coating, etc., can solve problems such as invisible optical films, and achieve the effect of high brightness and improved resolution

Inactive Publication Date: 2007-07-11
中科大资产经营有限责任公司
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] According to China's "Modern Instruments" (2005 Issue 06), the reactive sputtering method has been widely used in the preparation of optical films, including metal oxide or nitride optical films of Ti, Ta, Al, Zr, Nb or Hf, But do not see so far reactive sputtering to prepare the oxide system of Y and Zr or Al and Zr mix and be used for the report of optical film; ) introduction, doped ZrO 2 , especially Y-doped stabilized ZrO 2 The system is often used in the fields of fuel cells, temperature and wear resistance, and piezoelectric ceramics, but it has not been applied to optical thin films.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-temperature-resistant optical film doped with stabilized zirconia and method for preparing same
  • High-temperature-resistant optical film doped with stabilized zirconia and method for preparing same
  • High-temperature-resistant optical film doped with stabilized zirconia and method for preparing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Example 1: Using magnetron reactive sputtering to prepare a long-wave transmission filter with high temperature resistance

[0019] What is used in this embodiment is the ASC-800 magnetron reactive sputtering apparatus produced by Japan Shincron Company.

[0020] Using the magnetron reactive sputtering apparatus to prepare yttria-stabilized zirconia and silicon dioxide (YSZ / SiO 2 ) The process of the 20-layer long wave passing through the filter is as follows:

[0021] First prepare YSZ and SiO 2 single layer film. The metal target used to prepare the YSZ layer is a mixed metal plate spliced ​​by metal yttrium (Y) and metal zirconium (Zr), as shown in Fig. 1 and Fig. 2 . The mixed target 1 in the schematic diagram of the magnetron sputtering apparatus shown in FIG. 3 needs to be formed by placing two mixed metal plates side by side as shown in FIGS. 1 and 2 . Each mixed metal plate shown in Figures 1 and 2 is arranged with 12 pieces of zirconium metal (squares marke...

Embodiment 2

[0036] Embodiment 2: adjusting the power of the sputtering power supply can obtain the high temperature resistance characteristics of the single-layer YSZ thin films of different proportions

[0037] For mixed metal targets, the Y in the final film can be adjusted by changing the ratio of Y and Zr in the target, or adjusting the power of its sputtering power supply. 2 o 3 with ZrO 2 The molar ratio is 7--25:100, so that the film has high temperature resistance. This is because the sputtering rate ratio of metal Y and metal Zr is different under different powers, so the ratio of the film prepared by using the mixed metal target changes with the power; and for the alloy target of Y and Zr, The sputtering rate ratio of Y and Zr strictly follows the ratio of Y and Zr in the alloy, and does not change with the change of power. Therefore, for alloy targets, the ratio of Y and Zr in the target can only be adjusted to adjust the sputtering rate in the final film. the Y 2 o 3 with...

Embodiment 3

[0042] Embodiment 3: Changing the power supply to prepare another kind of single-layer YSZ film and its high temperature resistance characteristics

[0043] In this embodiment, the metal target used for preparing YSZ transparent single-layer film by magnetron reactive sputtering device is the mixed target designed and used in embodiment 1 by splicing metal Y and Zr; the sputtering process pressure is 0.17Pa, Adjust the power supply to 4kW, and the flow rates of oxygen and argon are both 100 milliliters per second under standard conditions.

[0044] Analyze the YSZ thin film prepared in the present embodiment with X-ray photoelectron spectroscopy, draw its Y 2 o 3 with ZrO 2 The molar ratio is 7:100.

[0045] By selecting several temperatures within the temperature range of 400°C to 1000°C for the test of the transmittance spectrum of the YSZ film prepared in this example, the curve of the obtained transmittance curve corresponding to the wavelength basically does not change...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The thermostable optical film mixed with stabilizing zircite features in the magnetic control reaction sputter or free auxiliary sputter, with Y and Zr mole ratio being 10-50:100 or Al and Zr 3. 5-9:10 formed mixed target material as the source for sputtering, getting the multi layer film stacked alternatively by stabilizing zircite high refraction rate and non crystalisation SiO2, with the zircite being stabilizer ZrO2 with Al2O3 or zircite mixed with Y203, if the mixed content is Y203, the mole ratio of it with ZrO2 would be 5-25:100, if Al203, then its mole ratio with ZrO2 would be 1. 7-4. 5:10.It can be used as optical film filter, thin film outside the bulb filtering infrared, or thin film component for optical measurement under 500-1000DEG C.

Description

Technical field: [0001] The invention belongs to the technical field of preparation of optical functional films, in particular to a high temperature resistant optical film doped with stabilized zirconia and a preparation method thereof by magnetron reactive sputtering Background technique: [0002] According to "Optics Handbook" (Shaanxi Science and Technology Press, 1986 edition, pages 609-637), optical multilayer films are stacked with two or more materials with different refractive indices. A layer of interface reflection, and the reflected light from different interfaces interfere with each other to obtain various optical effects. Therefore, different optical properties can be achieved by adjusting and controlling the thickness of each layer. For example, the light transmittance or reflectivity of specific wavelengths of light can be enhanced, such as anti-reflection coatings that can be applied to cameras or video cameras, color photography, color Media cut-off filter ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00C23C14/35C23C14/54C23C14/14
Inventor 黄烽王海千李明谢斌侯建国宋亦周姜友松
Owner 中科大资产经营有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap