Gel nail polish and its manufacturing and using method

Abstract

A gel nail polish composition includes a gel nail polish mixture and a color agent mixing therewith for forming a gel nail polish layer on a nail of a user. The gel nail polish mixture includes first through fourth chemical elements, wherein the first through fourth chemical elements are aliphatic urethane acrylate, polymer acrylate oligomer, propoxylated neopentyl glycol diacrylate, and trimethylbenzoyl diphenylphosphine oxide. The wipe off base coat layer, the gel nail polish layer, and the top coat layer are dried under an exposure of one of LED light, UV light, and sunlight that no wet sticky colloid is formed after the top coat layer is dried. The gel nail polish layer is adapted for being removed by directly wiping off the gel nail polish layer on the nail by using a rag, cotton, or tissue paper with the nail polish remover.

Description

NOTICE OF COPYRIGHT[0001]A portion of the disclosure of this patent document contains material which is subject to copyright protection. The copyright owner has no objection to any reproduction by anyone of the patent disclosure, as it appears in the United States Patent and Trademark Office patent files or records, but otherwise reserves all copyright rights whatsoever.BACKGROUND OF THE PRESENT INVENTION[0002]Field of Invention[0003]The present invention relates to a gel nail polish, and more particularly to an easily wipeable gel nail polish and its manufacturing and using method, wherein the gel nail polish is dried out easily and can be directly wipe off by the polish remover without a complicate removing process.[0004]Description of Related Arts[0005]Gel nail polish are relative new in the market but has become really popular at nail salons and for nail painting enthusiasts in a short time. One of the popular gel nail polish is soft gel polish, which is often called as a soak o...

AI Technical Summary

Benefits of technology

The present invention provides a gel nail polish that has several technical advantages. Firstly, the removing process is simple without requiring aluminum foils or additional tools. Secondly, the polish does not leave any residue on the fingertip or require additional cleaning steps. Thirdly, the polish can be easily and quickly dried using natural sunlight. Fourthly, the method for application and removal is time-saving and money-saving for the user. Lastly, the invention provides an economic and efficient solution to simplify the application and removal process for gel nail polish.

Problems solved by technology

In other words, each layer cannot be dried under the sunlight, so that it is inconvenience and money-wasting for the users to prepare and purchase the LED light or the UV light device.

Furthermore, the removing process of the soak off gel nails is inconvenience and troublesome.

For such removing process, the users will spend at least 30 minutes to remove the soak off nail polish layer from their nails, and the nails will be damaged and thinned by frequently using the nail file or nail buffer.

Images