Heat mode sensitive imaging element for making positive working printing plates
a technology of positive working and imaging element, which is applied in the direction of lithography, photosensitive materials, instruments, etc., can solve the problems of complex development and associated developing liquids, cumbersome and laborious methods of working, and insufficient photosensitive coating to be directly exposed with a laser. , to achieve the effect of increasing the run length of printing plate, improving durability
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example 2
[0094] Preparation of the lithographic base
[0095] A 0.30 mm thick aluminum foil was degreased by immersing the foil in an aqueous solution containing 5 g / l of sodium hydroxide at 50.degree. C. and rinsed with demineralized water. The foil was then electrochemically grained using an alternating current in an aqueous solution containing 4 g / l of hydrochloric acid, 4 g / l of hydroboric acid and 5 g / l of aluminum ions at a temperature of 35.degree. C. and a current density of 1200 A / m2 to form a surface topography with an average center-line roughness Ra of 0.5 .mu.m.
[0096] After rinsing with demineralized water the aluminium foil was then etched with an aqueous solution containing 300 g / l of sulfuric acid at 60.degree. C. for 180 seconds and rinsed with demineralized water at 25.degree.C. for 30 seconds.
[0097] The foil was subsequently subjected to anodic oxidation in an aqueous solution containing 200 g / l of sulfuric acid at a temperature of 45.degree. C., a voltage of about 10 V and a...
example 3
[0103] Preparation of the lithographic base
[0104] A 0.30 mm thick aluminum foil was degreased by immersing the foil in an aqueous solution containing 5 g / l of sodium hydroxide at 50.degree. C. and rinsed with demineralized water. The foil was then electrochemically grained using an alternating current in an aqueous solution containing 4 g / l of hydrochloric acid, 4 g / l of hydroboric acid and 5 g / l of aluminum ions at a temperature of 35.degree. C. and a current density of 1200 A / m2 to form a surface topography with an average center-line roughness Ra of 0.5 .mu.m.
[0105] After rinsing with demineralized water the aluminum foil was then etched with an aqueous solution containing 300 g / l of sulfuric acid at 60.degree. C. for 180 seconds and rinsed with demineralized water at 25.degree. C. for 30 seconds.
[0106] The foil was subsequently subjected to anodic oxidation in an aqueous solution containing 200 g / l of sulfuric acid at a temperature of 45.degree. C., a voltage of about 10 V and a...
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