Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects

a technology of residual processing effects and mask layout, which is applied in the field of integrated circuit mask analysis and locating areas in masks, can solve the problems of reducing image quality, residual aberrations still contributing significant spillover, and affecting the projection printing of mask patterns in integrated circuit layout, so as to dramatically reduce reduce the use of runtime and memory. the effect of reducing the computational complexity of pattern matching

Inactive Publication Date: 2006-12-07
RGT UNIV OF CALIFORNIA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009] In accordance with the invention, new algorithms have been created to replace the inefficient bitmap-based algorithms in pattern matching. One new algorithm is based on extracting edges from the geometry, pre-integrating the pattern in one dimension, and adding contributions from each pixel wide strip between two edges of each shape overlapping the pattern. Another new algorithm takes the method one step further to the rectangles themselves, pre-integrating the pattern in two dimensions and adding contributions from each rect...

Problems solved by technology

At these dimensions, the projection printing of mask patterns in integrated circuit layout can be adversely impacted by small residual aberrations in the lens system.
While the quality metric (Strehl ratio) of today's projection printers is within a few percent of...

Method used

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  • Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
  • Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
  • Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects

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Embodiment Construction

[0037] As the critical dimension in optical lithography continues to shrink and additional phases are added to masks, it is becoming more important to determine where the geometry is affected the most by non-ideal process conditions. If the most problematic shapes can be identified and represented in an unambiguous form, then these test patterns can be used to locate areas in any layout that are the most sensitive to these effects. After the ‘hot spots’ have been found, the designer can go back and alter the geometry to reduce the sensitivity to these effects. Alternatively, these locations can be recorded and later examined after fabrication as a way to narrow down mask inspection regions. Locations of interest can be filtered to edges, line ends, inside corners, and / or outside corners.

[0038] In accordance with one application of the invention, a software system analyzes a mask layout and searches for locations sensitive to residual processing effects. Pattern matching is used to ...

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Abstract

Images such as mask layouts, signatures, and photographs are compared to identify similarities or dissimilarities in the images. Descriptions of the images use geometric shapes including lines, rectangles, and triangles to facilitate the comparisons and decrease comparison time and decrease stored data describing the shapes. Data for pixels in the shapes are pre-integrated to reduce arithmetic operations in the comparisons.

Description

CROSS-REFERENCES TO RELATED APPLICATIONS [0001] This application claims priority from provisional application Ser. No. 60 / 322,381, filed Sep. 11, 2001, and as a continuation-in-part of co-pending patent application Ser. No. 10 / 241,242, filed Sep. 10, 2002, which are incorporated herein for all purposes.STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [0002] The U.S. Government has rights in the disclosed invention pursuant to DARPA Grant MDA 972-01-1-0021 to the University of California at Berkeley.BACKGROUND OF THE INVENTION [0003] This invention relates generally to imaging lens systems and photo masks for optically defining patterns, and more particularly the invention relates to integrated circuit mask analysis and locating areas in a mask that are sensitive to residual processing effects. The invention has applicability in other image analysis, including signature analysis, for example. [0004] In the fabrication of electronic integrate...

Claims

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Application Information

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IPC IPC(8): G06F17/50G03F1/00A61B3/032G03F7/20
CPCA61B3/032G03F7/706A61B3/1015G06T7/0004G06T2207/10061G06T2207/20021G06T2207/20056G06T2207/30141G06T2207/30148
Inventor GENNARI, FRANK E.
Owner RGT UNIV OF CALIFORNIA
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