Exposure apparatus

a technology of exposure apparatus and exposure, which is applied in the field of exposure apparatus, can solve problems such as exposure failure, and achieve the effect of increasing exposure accuracy

Inactive Publication Date: 2007-02-15
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0008] The present invention has been made in consideration of the above problems, and has as its object to, e.g., increase the exposure accuracy by controlling the relative positional relationship between a structure which supports a substrate stage and a structure which supports a projection unit which projects an exposure beam onto a substrate.
[0009] An exposure apparatus according to the present invention is configured to form a latent image pattern on a substrate using an exposure beam, and comprises a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first anti-vibration supporting leg which includes a first actuator and supports the first structure, a second structure which supports a substrate stage which aligns the substrate, a second anti-vibration supporting leg which includes a second actuator and supports the second structure, and a control unit which controls at least one of the first actuator and the second actuator to reduce a relative displacement between the first structure and the second structure.
[0010] According to a preferred embodiment of the present invention, the first actuator can so operate as to reduce vibration of the first structure. In this case, preferably, the exposure apparatus further comprises a state detector which detects the state of the first structure, and the control unit controls the first actuator on the basis of the state of the first structure. This makes it possible to cause the first anti-vibration supporting leg to function as an active anti-vibration apparatus. For example, floor vibration insulation performance and performance to suppress vibration generated by a supporting target of the first anti-vibration supporting leg improve.

Problems solved by technology

Therefore, control of the relative positional relationship between the structures, i.e., the positional relationship between the original (or projection lens) and the substrate is often unsatisfactory, resulting in an exposure failure.

Method used

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first embodiment

[0042] The schematic structure of an exposure apparatus according to a preferred embodiment of the present invention will be described first with reference to FIGS. 6 to 9. FIG. 6 is a front view of the exposure apparatus. FIG. 7 is a side view of the exposure apparatus. FIG. 8 is a plan view showing a lens barrel base 112 as a first structure on which, e.g., a projection unit (e.g., reticle stage (original stage) 107 and projection lens (projection optical system) 109) is mounted. FIG. 9 is a plan view showing a wafer stage base 113 as a second structure on which, e.g., a wafer stage (substrate stage) 111 is mounted.

[0043] The exposure apparatus according to the preferred embodiment of the present invention forms, using an exposure beam (a beam such as ultraviolet light, an excimer laser beam, EUV light (extreme ultraviolet light), X-rays, or an electron beam), a latent image pattern on a substrate coated with a photosensitive agent. The exposure apparatus which transfers the patt...

second embodiment

[0086] The second embodiment of the present invention may follow the first embodiment except for synchronous control of a lens barrel base 112 and wafer stage base 113.

[0087] In the second embodiment, an anti-vibration supporting leg control operation unit 203 calculates the manipulated variables of anti-vibration supporting legs 101, 102, and 103 using control signals of anti-vibration supporting legs 104, 105, and 106. A stage control operation unit 202 sends a control signal 211 from its port P2 to an actuator (first actuator) of each of the anti-vibration supporting legs 101, 102, and 103, thereby synchronizing the lens barrel base 112 with the wafer stage base 113.

[0088] In the first arrangement example shown in FIG. 3, a switch 408 is set ON and a switch 409 is set OFF to cause a synchronous compensator 401 to generate, on the basis of a control signal 313, a control signal 416 serving as a correction signal of a control signal 312. The synchronous compensator 401 adds the c...

third embodiment

[0091] The third embodiment of the present invention may follow the first embodiment except for synchronous control of a lens barrel base 112 and wafer stage base 113.

[0092] In the third embodiment, an anti-vibration supporting leg control operation unit 203 calculates the manipulated variables of anti-vibration supporting legs 104, 105, and 106 using control signals of anti-vibration supporting legs 101, 102, and 103. An anti-vibration supporting leg control operation unit 203 sends a control signal 212 from its port P4 to an actuator (second actuator) of each of the anti-vibration supporting legs 104, 105, and 106, thereby synchronizing the lens barrel base 112 with the wafer stage base 113.

[0093] In the first arrangement example shown in FIG. 3, a switch 408 is set OFF and a switch 409 is set ON to cause a synchronous compensator 401 to generate, on the basis of a control signal 312, a control signal 417 serving as a correction signal of a control signal 313. The synchronous co...

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Abstract

An exposure apparatus includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first anti-vibration supporting leg which includes a first actuator and supports the first structure, a second structure which supports a substrate stage which aligns the substrate, a second anti-vibration supporting leg which includes a second actuator and supports the second structure, and a control unit which controls at least one of the first actuator and the second actuator to reduce the relative displacement between the first structure and the second structure.

Description

FIELD OF THE INVENTION [0001] The present invention relates to an exposure apparatus which forms a latent image pattern on a substrate using an exposure beam. BACKGROUND OF THE INVENTION [0002] To attain stable micromachining, a precision apparatus such as a semiconductor manufacturing apparatus must be maximally insulated from vibration conducted from the external environment. Therefore, such a precision apparatus needs to be mounted on an anti-vibration apparatus. In particular, an anti-vibration apparatus in a semiconductor exposure apparatus is demanded to realize with good balance external vibration insulation performance and performance to suppress internal vibration generated upon activating a substrate stage because it continuously moves at a high speed. [0003] In response to such a demand, recently, an active anti-vibration apparatus is being used. The active anti-vibration apparatus controls vibration by driving an actuator in accordance with a detection signal output from...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G03B27/58
CPCG03F7/709G03F7/70833
Inventor SHIBAYAMA, TAKASHI
Owner CANON KK
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