Semiconductor device, manufacturing method of semiconductor device, and RFID tag
a semiconductor device and manufacturing method technology, applied in the direction of semiconductor devices, semiconductor/solid-state device details, electrical equipment, etc., can solve the problems of production cost, processing cost, material cost, etc., and achieve the effect of high efficiency, low cost and high performan
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
embodiment modes
[0047]Embodiment modes of the present invention are hereinafter explained with reference to the drawings. However, the present invention is not limited to the following description. As is easily known to a person skilled in the art, the mode and the detail of the present invention can be variously changed without departing from the spirit and the scope of the present invention. Thus, the present invention is not interpreted as being limited to the following description of the embodiment modes. Note that the same reference numeral is commonly used to denote the same component among different drawings in structures of the present invention explained below.
[0048]In addition, the present invention can be applied to a semiconductor device which uses any of frequency mode, for example, a long wave band (135 kHz or the like), a short wave band (6.78 MHz, 13.56 MHz, 27.125 MHz, 40.68 MHz, or the like), an ultra-short wave band (433.92 MHz, 869.0 MHz, 915.0 MHz, or the like), a microwave ban...
embodiment mode 1
[0049]This embodiment mode describes a manufacturing method of a semiconductor device using a plurality of IC chips, particularly a manufacturing method of an RFID tag with reference to FIGS. 1A to 3C below.
[0050]First, a depression 101 and a depression 102 each having an arbitrary shape are formed in a base 100 (see FIG. 1A). As a material of the base 100, a synthetic resin having flexibility such as plastic which is typified by polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polyethersulfone (PES), or acrylic can be used. The depression 101 and the depression 102 can be formed using an embossing machine, a punching machine, or the like. The depression 101 and the depression 102 can also be formed using a laser ablation, an FIB (Focused Ion Beam), or the like.
[0051]At this time, the depression 101 and the depression 102 are preferably formed to have different shapes and sizes. This is because IC chips are selectively disposed in accordance with functions when t...
embodiment mode 2
[0071]In this embodiment mode, a manufacturing method of a semiconductor device using a plurality of IC chips, particularly a manufacturing method of an RFID tag is described below with reference to FIGS. 4A to 6B when restoration can be performed by a droplet discharging method when forming a wiring. Note that steps up to and including the state shown in FIG. 1B of Embodiment Mode 1 can be similarly used in this embodiment mode; therefore, detail description is omitted.
[0072]The state shown in FIG. 1B of Embodiment Mode 1 is obtained, and then, a protective film 405 having an insulating property is provided so as to cover a base 400, an IC chip 403, and an IC chip 404. Note that the base 400, the IC chip 403, the IC chip 404, and the protective film 405 correspond to the base 100, the IC chip 103, the IC chip 104, and the protective film 105 in FIG. 1, respectively. Here, a planarizing film having an insulating property may be formed instead of the protective film 405. The planariz...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


