Electroless Plating Pretreatment Agent and Copper-Clad Laminate for Flexible Substrate
a technology of electroless plating and pretreatment agent, which is applied in the direction of liquid/solution decomposition chemical coating, transportation and packaging, coatings, etc., can solve the problems of high method cost, unstable adhesive force in an environment requiring heat resistance, and insufficient adhesive for
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example 1
[0047] An electroless plating pretreatment agent with an organic solvent (butanol) including 1 g / L of imidazole silane (an equimolar reaction product of imidazole and 3-glycidoxypropyltrimethoxysilane), 0.5 g / L (100 mg / L of palladium) of palladium soap (palladium naphthenate, manufactured by Nikko Materials), and 1 g / L of epoxy resin (Epicoat EP828, manufactured by Japan Epoxy Resins) was applied to the surface of the commercially available polyimide film Kapton (200H, manufactured by Toray-DuPont). After removing the solvent at 150° C. and forming a pretreatment agent layer having a thickness of 70 nm, a copper plating layer having a thickness of 0.5 μm was formed by electroless copper plating (plating solution: NKM554, manufactured by Nikko Metal Plating), and electric copper plating (plating solution: copper sulfate base, manufactured by Nikko Metal Plating) was carried out with a current density of 2 A / dm2 to form a copper plating layer having a thickness of 35 μm. The peeling s...
example 2
[0048] An electroless plating pretreatment agent with an organic solvent (butanol) including 1 g / L of imidazole silane (an equimolar reaction product of imidazole and 3-glycidoxypropyltrimethoxysilane), 0.5 g / L (100 mg / L of palladium) of palladium soap (palladium naphthenate, manufactured by Nikko Materials), and 2 g / L of phenol resin (XLC-4L, manufactured by Mitsui Chemicals) was applied to the surface of the commercially available polyimide film Kapton (200H, manufactured by Toray-DuPont). After removing the solvent at 150° C. and forming a pretreatment agent layer having a thickness of 70 nm, a copper plating layer having a thickness of 0.5 μm was formed by electroless copper plating (plating solution: NKM554, manufactured by Nikko Metal Plating), and electric copper plating (plating solution: copper sulfate base, manufactured by Nikko Metal Plating) was carried out to form a copper plating layer having a thickness of 35 μm. The peeling strengths in an ordinary state and after ag...
example 3
[0049] Treatment and testing were carried out in the same manner as in Example 1 except that aminosilane (γ-aminopropyltriethoxysilane, manufactured by Shin-Etsu Chemical) was used in place of the imidazole silane in Example 1. The results showed a high post-aging strength of 0.4 kgf / cm as in Table 1.
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