Method and Apparatus for Measuring Device Mismatches
a technology of mismatching and measuring devices, applied in the direction of digital storage, instrumentation, marginal circuit testing, etc., can solve the problems of large number of cells, difficult computer-aided physical design, and large number of connections between cells, and achieve the effect of high spatial resolution of measurements
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[0025]The present invention is directed to an improved method and apparatus for measuring mismatches in electronic devices. Local device mismatches have short correlation distances, so characterization of random mismatches requires test structures with closely placed devices wherein each device can effectively be measured individually. The structures disclosed herein are useful for such statistical characterization of intrinsic parameter fluctuations in metal-oxide semiconducting field-effect transistor (MOSFET) devices. The test structures feature a large array of densely populated SRAM-sized devices that allow fast and precise measurement of electrical characteristics of each individual device. These structures may be used to characterize the variations in device parameters for different threshold implantation levels in a 65 nm silicon-on-insulator (SOI) process.
[0026]With reference now to the figures, and in particular with reference to FIG. 2, there is depicted a layout for one...
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