Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optical substrates having light collimating and diffusion structures

a technology of optical substrates and structures, applied in the direction of instruments, lenses, other domestic objects, etc., can solve the problems of less effective light directing, less light scattering, and invisible to the user, so as to achieve the effect of increasing the overall brightness of lcd, and not reducing the overall brightness of the light transmitted through the lenticular surfa

Inactive Publication Date: 2016-03-10
UBRIGHT OPTRONICS CORP
View PDF6 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention is about an optical substrate that has both light-collimating and light-diffusing functions. This substrate can be made in the form of a flexible or rigid film, sheet, or plate with a structured surface that enhances luminance or brightness by collimating light and diffusing light. The substrate has a structured prismatic surface and an opposing structured lenticular surface with shallow-curved lens structures. The lens structures can be continuous or divided, and can have different shapes and be textured to further enhance diffusion. The technical effect of this invention is an optical substrate that can improve brightness and luminance of optical devices and systems.

Problems solved by technology

Such diffusion treatments will hide many of the interference fringes, making them invisible to the user.
One of the disadvantages of these approaches is that light scattering decreases on-axis gain.
Moreover, the hybrid brightness enhancement films are also less effective in directing light within the desirable viewing angle.
Further, all the above-mentioned hybrid brightness enhancement films involve relatively complex structures requiring relatively higher manufacturing costs.
Because the composite film used in the portable apparatus is thinner, the product has a bad stiffness and some undesired phenomenon (e.g., Newton's ring, wet-out) easily happens.
Moreover, people use the portable apparatus in a short-distance manner, and rainbow phenomenon easily affects display quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical substrates having light collimating and diffusion structures
  • Optical substrates having light collimating and diffusion structures
  • Optical substrates having light collimating and diffusion structures

Examples

Experimental program
Comparison scheme
Effect test

experiment a

[0123]Table 1 shows the effects of the angle θ of the lenticular structure (e.g., similar to embodiment shown in FIG. 6a, with flat ratio at 0%) on gain and diffusion / haze. It has been observed that interference fringes are eliminated and the gain maintained between 1.49 and 1.54 for angle θ in the range of 16 degrees to 66 degrees.

TABLE 1Haze(single sideGainlenticular(with prismstructurestructurewith noon theLenticular structureFlatprismlight RadiusAngle θRefractiveAngle αratiostructure)outputDark and bright(μm)(deg.)Index(deg.)%%side)fringes60061.489002.381.55Observed600161.4890020.251.54Observed600261.4890042.921.53Very slight58361.4890058.041.53Not observed600461.4890065.61.51Not observed600561.4890070.831.49Not observed58661.4890072.91.51Not observed58821.4890078.241.42Not observed581061.4890079.091.25Not observed581201.4890081.011.23Not observed581441.48900 81.181.20Not observed

experiment b

[0124]Table 2 shows the effects of the refractive index of the lenticular structure (e.g., structure shown in FIGS. 6a and 8 with zero flat ratio). At bigger angles θ, haze is higher but gain is lower. Haze will increase when the refractive index of lenticular structure increases. However, the gain of optical substrate will decrease. It appears that the preferred refractive index of lenticular structure is in the range of 1.45 to 1.58.

TABLE 2Haze(single sideGain lenticular(with prismstructurestructurewith noon theLenticular structureFlatprismlight RadiusAngle θRefractive Angle αratiostructure)outputDark and bright(μm)(deg.)Index(deg.)%%side)fringes58821.5690087.21.34Not observed58661.5690075.71.48Not observed58521.5690071.81.51Not observed58361.5690063.01.51Not observed58821.4890078.21.42Not observed58661.4890072.91.51Not observed58 521.4890068.41.53Not observed58 361.4890 058.01.53Not observed

experiment c

[0125]Table 3 shows there is no significant change in haze and gain while changing lenticular radius (e.g., structure shown in FIGS. 6a and 8 with zero flat ratio). However, angle θ is significant to changes in haze and gain.

TABLE 3Haze(single sideGain lenticular(with prismstructurestructure with noon the Lenticular structureFlatprismlightRadiusAngle θRefractive Angle αratiostructure)output Dark and bright(μm)(deg.)Index(deg.)%%side)fringes7.81061.4890077.21.35Not observed231061.4890081.51.34Not observed581061.4890079.11.25Not observed7.8661.4890070.51.51Not observed23661.4890070.01.51Not observed58661.4890072.91.51Not observed7.8361.4890029.31.55observed23361.4890050.91.54Not observed58361.4890058.01.53Not observed

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Widthaaaaaaaaaa
Surface areaaaaaaaaaaa
Login to View More

Abstract

This invention discloses a method of forming an uneven structure on a substrate. Use a hard tool to penetrate into a mold to cut a first trench and a second trench in an order on a surface of a mold, wherein the hard tool has a smoothly-curved shape such that the transverse width of each of the first trench and the second trench increases as the penetrating depth of the hard tool increases, wherein when each of the first trench and the second trench marches along a first direction, the penetrating depth of the hard tool is controlled by repeating moving the hard tool up and down to cut the mold such that the transverse width of each of the first trench and the second trench varies according to the controlled penetrating depth of the hard tool, wherein the first trench and the second trench completely overlap with each other with no space therebetween. Then, use the surface of the mold to emboss a thin film on a substrate.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a continuation-in-part of U.S. patent application Ser. No. 14 / 469,572 filed on Aug. 26, 2014, which is a continuation-in-part of U.S. patent application Ser. No. 14 / 166,842 filed on Jan. 28, 2014, which is a continuation-in-part of U.S. patent application Ser. No. 13 / 073,859, now U.S. Pat. No. 8,638,408, which claims priority of (a) U.S. Provisional Application Ser. No. 61 / 318,061 filed on Mar. 26, 2010; and (b) U.S. Provisional Application Ser. No. 61 / 406,094 filed on Oct. 22, 2010. All of these applications are incorporated by referenced herein in their entirety.BACKGROUND[0002]1. Field of Invention[0003]The present invention relates to optical substrates having a structured surface, particularly to optical substrates for brightness enhancement and diffusion, and more particularly to brightness enhancement and diffusion substrates for use in flat panel displays having a planar light source.[0004]2. Description of Rel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B29D11/00B26D3/06B29C33/38G02F1/1335
CPCB29D11/00278B29C33/3842B26D3/06G02F2001/133507B29K2067/003B29K2995/0018B29L2011/0016G02F1/133504B29C33/424B29L2011/00G02B3/0043G02B3/0068G02B5/0215G02B5/0221G02B5/0278G02B6/0051B29D11/00798B29C59/026B29C2035/0827B29C2059/023G02B6/0053G02F1/133607G02B6/0058G02B27/30
Inventor YANG, CHING-ANPAN, HAN-TSUNG
Owner UBRIGHT OPTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products