Appearance inspection apparatus and method in which plural threads are processed in parallel
a technology of appearance inspection and processing method, which is applied in the direction of program control, instruments, semiconductor/solid-state device testing/measurement, etc., can solve the problems of imposing a limitation on high-speed processing, limitation of image data, and second prior art problem similar to the first prior art, etc., and achieves simple configuration and high speed
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Benefits of technology
Problems solved by technology
Method used
Image
Examples
first embodiment
(First Embodiment)
[0050]In the appearance inspection apparatus according to the first embodiment of the present invention, one inspection region on image data is divided into four sub-regions. The image data on the respective sub-regions are processed in parallel by using four CPUs. The case of the void inspection will be described below as an example. It should be noted that, in this first embodiment, “n” of the present invention is “4”, “k” of the present invention is “3” and “m” of the present invention is “1”.
[0051]In this void inspection, “Binary Conversion Process”, “Inversion Process”, “Area Measurement Process”, and “Inspection Judgement Process” are sequentially carried out. In the “Binary Conversion Process”, an image data, which is sent from the camera 19 through the data input controller 18 and the system bus 20 and stored in the memory 14, is converted into a binary value. In the “Inversion Process”, the binary value is inverted to thereby generate binary image data. In...
second embodiment
(Second Embodiment)
[0073]An appearance inspection apparatus according to a second embodiment of the present invention will be described below. The appearance inspection apparatus according to the first embodiment is designed such that all the processes, such as the binary conversion process, the inversion process and the area measurement process, are executed in parallel to each other by the plurality of threads. However, the appearance inspection apparatus according to the second embodiment is designed such that a particular process in the above-mentioned plurality of processes is executed by a single thread. It should be noted that, in this second embodiment, “n” of the present invention is “4”, “k” of the present invention is “2” and “m” of the present invention is “1”.
[0074]A thread generation process to be executed at the time of a void inspection firstly calculates a size of a void inspection region. Then, it is checked whether or not this calculated size is greater than a pre...
third embodiment
(Third Embodiment)
[0086]An appearance inspection apparatus according to a third embodiment of the present invention is designed as follows. That is, when executing a process that is difficult to carry out a parallel process, for example, such as a histogram process or a projection process, if there are a plurality of inspection regions, each sub-region is processed by one thread.
[0087]FIG. 6 shows an example of image data of an IC to be used in this third embodiment. In the void inspection, the void inspection region is set on the package portion of the IC, as described in the first and second embodiments.
[0088]In an inter-lead extraneous material inspection, first to fourth inter-lead extraneous material inspection regions are set for each side, in a lead portion of the IC. Then, four threads are generated correspondingly to the first to fourth inter-lead extraneous material inspection regions. In each of threads, a procedure for carrying out the inter-lead extraneous material insp...
PUM
Property | Measurement | Unit |
---|---|---|
rotation | aaaaa | aaaaa |
size | aaaaa | aaaaa |
speed | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com