Method for improving tin sulfide semiconductor film conductivity
A high-conductivity, semiconductor technology, used in semiconductor devices, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as no practical application, and achieve the effect of easy operation and simple process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0013] The process and steps in the embodiment of the present invention are as follows:
[0014] (1) According to the required conductivity and the curve shown in Fig. 1, in the high-purity 99.999% tin sulfide powder, add 1.1wt% metal antimony powder, and fully grind and mix;
[0015] (2) Put the above-mentioned mixture in a molybdenum boat, then put it into a conventional vacuum coating machine, place the glass substrate to be plated in the coating machine, and the vacuum degree in the vacuum coating machine is 1.5~2.0×10 -4 Pa, the distance between the glass substrate and the evaporation source (ie molybdenum boat) is 10cm, and the temperature of the evaporation source is 1100°C. Under these conditions, vacuum evaporation coating is carried out, and finally a tin sulfide semiconductor film with high conductivity can be obtained on the substrate.
[0016] It can be seen from the figure that in the method of the present invention, the weight percentage of antimony doped is in ...
Embodiment 2
[0017] Embodiment 2: This embodiment is basically the same as the above embodiment, except that the amount of antimony added is 0.2wt%. The substrate used is a silicon wafer.
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
