Method for manufacturing semiconductor electric heating membrane
A manufacturing method and technology of electric heating film, which are applied to electric heating devices, ohmic resistance heating, electrical components, etc., can solve the problems of insufficient raw materials and manufacturing process, safety and manufacturing cost reduction, production and other problems
Inactive Publication Date: 2008-12-03
林正平
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[0029] However, according to the above-mentioned existing electric heating film manufacturing technology, the materials used and the manufacturing process are not sophisticated enough to produce a semiconductor electric heating film with high temperature, power saving, high heating efficiency, safety and greatly reduced manufacturing costs.
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[0039] The novelty and other features of the present invention will be described in conjunction with the following detailed description of the preferred implementation.
[0040] In an embodiment, the solvent medium of the above-mentioned preparation method can be water, methanol, ethanol, hydrochloric acid, sulfuric acid and the like.
[0041] In a preferred embodiment, the substrate of the above-mentioned preparation method can be a material with a low expansion number that is resistant to high temperature and insulating, such as enamel, quartz, glass, and ceramics.
[0042] In an ideal embodiment, the temperature of the atomization growth in the above method is 500-1000 degrees, and the required time is 1-10 minutes.
[0043] In a preferred embodiment, the atomization growth thickness of the above-mentioned preparation method is 0.5-5 μm.
[0044] In an embodiment, the present invention at least comprises the following steps:
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Present invention refers to an membrane manufacturing method. It uses sternum, vanadum, chloridate and silicide as main material, adding iron, stibium, indium, etc compound as adulterant uniformity mixing and mixing with solvent media according to special proportion, adding a little mineral acid, when blending agents main material generating oxidation-reduction reaction, then washing up base plate using super sound and clearing by pure water, setting base plate in high temperature furnace to heat slowly according to production line mode, when base plate surface reaching transient point temperature blowing out above-mentioned raw material through nonferrous and acid proof alkaline material made spray nozzle, to become high temperature atomized charged particle and depositing on base plate.
Description
technical field [0001] The present invention relates to a method for manufacturing a semiconductor electrothermal film. Background technique [0002] Most of the traditional electric heating devices use resistance wires, which are converted into electric heat energy due to resistance after being energized. However, in general, the cost of the material for the resistance wire is relatively high, and the winding process of the resistance wire in the factory is also more troublesome and inconvenient. [0003] When the resistance wire is energized and used, it will produce a red open flame phenomenon. Because the traditional resistance wire electric heating device will have an open flame when it is used, it is not suitable as a heating device for equipment such as frigid oil fields. [0004] Nowadays, due to the rapid evolution of semiconductor technology, compared with traditional resistance heaters, electric heating devices made of semiconductors have the advantages of high ...
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IPC IPC(8): H05B3/26H05B3/12
Inventor 林正平
Owner 林正平