Precision vibration-damping assembly and vibration-damping platform constituted therefor

Abstract

The invention discloses a precision damping assembly and a damping platform formed by the precision damping assembly, which has the functions of damping and Z-direction positioning. Precision damping components include passive damping components, active damping actuators and outer frames. The passive damping part adopts a piston rod with a double-cavity structure. The airbag and the pressure chamber are respectively located in the two cavities. The airbag has a large longitudinal support force and low rigidity, which can isolate and attenuate high-frequency vibration. The active vibration damping actuator is a linear voice coil motor, which is connected in parallel with the passive vibration damping part. According to the vibration state and position information of the controlled object, it exerts force on the passive object, drives the controlled object to move to the designated position and compensates for the vibration. . The vibration reduction platform composed of at least three precision vibration reduction components has multi-degree-of-freedom vibration reduction, Z-direction precise positioning and leveling and focusing functions. The invention can be used in equipment requiring precision vibration reduction, such as photolithography machines, ultra-precision numerical control machine tools, and biological chip scanners.

Description

technical field [0001] The invention belongs to the precision preparation technology, and in particular relates to a precision vibration damping component and a vibration damping platform composed of it. The invention has the functions of precise vibration reduction, precise leveling and focusing, and can be used for high-precision equipment such as photolithography machines, precision machine tools, and precision measuring equipment. Background technique [0002] Lithography machine is a kind of micro-electromechanical equipment with complex structure. The resolution and overlay accuracy reach nanometer level, which is extremely difficult to manufacture and is close to the limit of precision manufacturing technology. The requirements of the lithography machine for the vibration reduction system have also reached an extremely stringent level, which represents the highest difficulty of precision vibration reduction and is also the most typical application object of precision ...

AI Technical Summary

Problems solved by technology

[0003] The vertical positioning accuracy of the mask stage and wafer stage is also the main factor affecting the quality of lithography. In traditional lithography machines, a set of complex leveling and focusing mechanisms are usually used to ensure the vertical positioning accuracy. This will complicate the structure of the motion table, and at the same time make the control more difficult due to the increase of the inertia of the table

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