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Deposition film making system of pulse laser with added electric field

A technology of pulsed laser deposition and electric field applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems affecting the quality of film growth, etc., achieve easy operation, change performance, and realize directional arrangement and shape effect of change

Inactive Publication Date: 2007-07-25
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, if the electric field is directly strengthened by metal plates at both ends of the substrate, the charged particles in the plume will conduct the two electrodes and cause instantaneous ignition discharge, which will seriously affect the growth quality of the film.

Method used

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  • Deposition film making system of pulse laser with added electric field
  • Deposition film making system of pulse laser with added electric field
  • Deposition film making system of pulse laser with added electric field

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Make a PLD film-making system with an externally enhanced electric field as shown in Figures 1 and 2.

[0030] Using a PLD film-making system, an external electric field device is arranged behind the substrate heater in the vacuum chamber 14 of the PLD film-making system. The vacuum degree of the traditional vacuum chamber 14 is realized by the vacuum unit 5 composed of a mechanical pump, a molecular pump and pipelines below it, and the vacuum degree is read by a ZDF-9 composite vacuum gauge. The high-pressure gas bottle 9 communicates with the needle valve on the wall of the vacuum chamber 14 and the vacuum chamber through a pipeline to provide different gas atmospheres. In the vacuum chamber 14, the target assembly 13 and the substrate heater 10 are installed. The target assembly uses a traditional PLD film-making system, that is, it is composed of 4 small discs made of stainless steel installed on a large disc; the small disc The target is fixed on the top; the larg...

Embodiment 2

[0033] Utilize the device of embodiment 1 to prepare Ag / BaTiO 3 Composite film, the specific process is as follows:

[0034] Ag / BaTiO 3 The target material is fixed on the rotating target. 5×10×0.5mm3 The double-polished MgO substrate is placed on a 10mm wide silicon heater, and a parallel electric field device and the entire external circuit are applied. The distance between the two ceramic blocks is adjusted to 11mm, and the distance between the two metal plates is 20mm. The distance between the target and the substrate is about 4cm. Vacuum the background to 5×10 -4 Pa, filled with nitrogen to 10Pa. The substrate temperature was kept at room temperature. The pulsed laser is generated by an excimer laser grown by LambdaPhysik in Germany, the working gas is XeCl, and the output wavelength is 308nm. The laser energy can reach 400mJ, the repetition frequency is adjustable, the pulse width is 20ns, and the energy density of the target surface is about 1.5~3J / cm 2 . Adjust...

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Abstract

This invention relates to a pulse laser deposition (PLD) system with extra electric field. The system adds an extra strong electric field device to the substrate heater of the traditional PLD apparatus. The electric field device comprises two metal plate electrodes, which are set in the notches of two concave ceramic blocks. The two ceramic blocks are vertically set and parallel to each other on a ceramic fixation plate. A through hole is drilled on one side of the notch of the ceramic block. Wire coated with ceramic pipe penetrates the through hole from the metal plate electrode, and is connected to a resistor and transformer power supply to form the whole circuit system. The system has simple structure. The system can obviously alter the microstructures of the grown thin films, and further alter the properties of the thin films. This invention provides an effective experimental device for preparing novel thin film samples with special structures.

Description

technical field [0001] The invention relates to a device for preparing thin films by pulse laser deposition, in particular to a system for preparing thin films by pulse laser deposition under the action of an external strong electric field. Background technique [0002] Pulsed laser deposition (hereinafter referred to as PLD) is one of the most commonly used methods for preparing thin films. A typical PLD equipment mainly consists of vacuum chamber, heater, target assembly, substrate stage and gas charging system. PLD equipment is simple, easy to operate, and has a fast deposition rate. It is widely used in the growth of complex perovskite oxide films, multilayer films, and composite films. [0003] In the field of thin film research nowadays, nanocomposite thin films have attracted widespread attention of scientific researchers due to their superiority in both traditional composite materials and modern nanomaterials, and have been increasingly studied and become an importa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/28C23C14/54
Inventor 宁廷银周岳亮赵嵩卿王淑芳韩鹏程波林金奎娟吕惠宾陈正豪何萌刘知韵杨国桢
Owner INST OF PHYSICS - CHINESE ACAD OF SCI