SiO deposition material, raw material si powder, and method for producing siO deposition material
A technology for vapor deposition materials and manufacturing methods, which is applied in the fields of vacuum evaporation coating, chemical instruments and methods, metal material coating processes, etc., can solve the problem of poor productivity, slow sublimation speed, and high manufacturing costs of SiO vapor deposition materials. problem, to achieve the effect of suppressing the splash phenomenon and reducing the hydrogen content
Inactive Publication Date: 2007-08-01
OSAKA TITANIUM TECHNOLOGIES
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Problems solved by technology
[0009] However, with the method proposed in JP-A-2002-97567, when the mixture of Si powder and silicon oxide powder is sublimated and deposited on the deposition matrix, the SiO vapor deposition material has a high volume density and a high hardness. Therefore, the sublimation rate has to be slowed down, and the productivity is deteriorated, so there is a problem that the production cost of the SiO vapor deposition material becomes high.
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[0044] The effects of the SiO vapor deposition material of the present invention will be described below using examples.
[0045] Mechanically destroy high-purity silicon wafers to obtain Si powder with an average particle size of 10 μm or less. It is subjected to heat treatment in a vacuum of 40 Pa or less at a temperature of 700°C or higher for 3 hours, or in an Ar gas atmosphere containing hydrogen at a heating temperature of 500 to 600°C to produce Si powders with different hydrogen contents.
[0046] As a mixed and granulated raw material prepared by mixing and granulating the prepared Si powder and SiO2 powder with an average particle diameter of 10 μm or less, the mixed and granulated raw material put into the raw material container is heated to 1100 to At 1350°C, it is sublimated, and SiO is precipitated on the precipitation matrix. Manufacture SiO samples with different hydrogen contents, and use the SiO formed by crushing, grinding, etc. as the SiO evaporation mater...
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Abstract
Disclosed is an SiO deposition material characterized by having a hydrogen gas content of not more than 50 ppm. By using such an SiO deposition material, occurrence of splash can be suppressed when SiO is deposited on a base, and there can be formed an SiO deposited film which is excellent in transparency and barrier properties. By carrying out degasification so that the hydrogen gas content of a raw material Si powder for the deposition material is not more than 10 ppm, the SiO deposition material having a hydrogen gas content of not more than 50 ppm can be produced highly efficiently at low cost. Consequently, this method for producing SiO can be widely applied to methods for producing deposition materials for packaging materials which have transparency and barrier properties and are used for medical products, medicinal products and the like.
Description
technical field [0001] The present invention relates to a SiO vapor deposition material that suppresses splashing during vapor deposition and is used as a transparent and barrier packaging material for foods, medical supplies, and pharmaceuticals, and Si powder for raw materials thereof, and an SiO vapor deposition material manufacturing method. Background technique [0002] Usually, in the case of packaging food in the field of food processing, oxygen, water vapor, aromatic gas, etc. will oxidize oil, vitamins, or protein by passing through the packaging material, thereby reducing the nutritional content of the food, causing fading and discoloration of the food, etc. Deterioration, etc., or deterioration of the flavor of food, etc., or absorption of unpleasant odors. Therefore, in the field of food processing, so-called gas barrier properties are required in order to prevent deterioration of oils and fats, proteins, etc., and prevent oxygen or moisture from permeating pack...
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IPC IPC(8): C23C14/24C01B33/037C01B33/113
CPCC01B33/113C23C14/10
Inventor 西冈和雄木崎信吾
Owner OSAKA TITANIUM TECHNOLOGIES