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Symmetrical double-telecentric projection optical system

A projection optical system and bi-telecentric technology, applied in the field of projection optical systems, can solve problems such as aberrations not meeting bumps, not meeting lithography, etc., to achieve the effects of reducing processing, improving imaging quality, and correcting chromatic aberration

Active Publication Date: 2007-08-22
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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Problems solved by technology

The patent gives the objective lens data and the imaging quality, but the aberration does not meet the requirements of bumping lithography technology at all, and there are two glued surfaces that do not meet the technical requirements of lithography

Method used

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  • Symmetrical double-telecentric projection optical system

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Embodiment Construction

[0020] The symmetrical bi-telecentric projection optical system of the present invention will be further described in detail below.

[0021] The present invention provides a symmetrical bi-telecentric projection optical system. As shown in Figure 1, the projection optical system of the present invention has a symmetrical structure, that is, it includes a front group, an aperture stop, and a rear group sequentially from the object plane side. , and each lens component of the front group and the rear group takes the aperture stop plane as the symmetry plane, the optical structure is completely symmetrical (the surface radii and intervals are equal, and the optical materials are consistent), and the magnification is -1. The combined rear focus of the front group coincides with the combined front focus of the rear group, and coincides with the center of the aperture stop, forming a double telecentric structure. The double-telecentric structure ensures that the magnification does n...

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Abstract

The invention provides a symmetrical double telecentric projection optical system, for imaging a graph in object plane into image plane. And it is a total refraction projection optical system, comprising front set and rear set, using aperture diaphragm as symmetrical surface, where the front set comprises first-fourth lens sets, the first lens set and the third lens set have negative focal power, and the second lens set and the fourth lens set have positive focal power, and the first and second lens sets and the third and fourth lens sets respectively compose retrofocus structure; the rear set comprises in turn fifth-eighth lens sets along the optical axis, respectively symmetrical with the fourth-first lens sets with respect to the aperture diaphragm; and it does not comprise nonspherical lens. And it can effectively correct aberration, enlarge operating focus length and improve imaging quality; and it is relatively simple to machine and detect, able to largely reduce the manufacturing cost.

Description

technical field [0001] The invention relates to a projection optical system for semiconductor lithography and photoplate making, in particular to a symmetrical double telecentric projection optical system. Background technique [0002] With the development of projection lithography technology, the performance of projection optical system is gradually improved, and can be applied to various fields such as integrated circuit manufacturing. Projection lithography technology has been successfully applied to the field of submicron resolution integrated circuit manufacturing. In semiconductor packaging technology, projection lithography technology can be used for gold bumps / tin bumps that require lower resolution (such as a few microns), larger depth of focus, and higher yields, and silicon wafer-level chip-scale packaging (WLCSP) technology and other fields. [0003] However, in the prior art, such as U.S. Patent No. 6,879,383 (announcement date: April 12, 2005), it adopts a ca...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B13/00G02B1/00G02B9/64
Inventor 蔡燕民周畅刘国淦
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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